Exposure machine, array substrate, patterned thin film, photoresist layer and forming method
A photoresist layer and patterning technology, which is applied in microlithography exposure equipment, originals for photomechanical processing, exposure devices for photo-plate making process, etc., can solve the problems of bright and dark lines on the display screen, uneven color of the lens, etc.
Active Publication Date: 2011-11-30
AU OPTRONICS CORP
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Problems solved by technology
In this way, although the strip patterns formed by using the photoresist pattern as a mask have the same pitch (that is, the sum of the width and the interval is the same), they will have different width / spacing ratios, resulting in a polymer-stabilized alignment liquid crystal display. The display screen of the panel has the problem of bright and dark lines, which is the so-called lens mura (Lens mura)
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[0064] Figure 1A is a schematic diagram of an exposure machine according to an embodiment of the present invention, and Figure 1B yes Figure 1A A schematic top view of the photomask. Please refer to Figure 1A The exposure machine 100 of this embodiment is suitable for exposing a photoresist layer 210 on a thin film 200 to form a plurality of stripe-shaped exposure patterns 212 on the photoresist layer 210 . The exposure machine 100 includes a light source 110 , a lens group 120 and a photomask 130 . The light source 110 may be a krypton fluoride laser, argon fluoride laser, fluorine laser or other known exposure light sources. The lens group 120 is disposed between the photoresist layer 210 and the light source 110 . The lens group 120 includes a plurality of strip lenses 122 arranged parallel to each other, wherein the overlapping area of any two adjacent strip lenses 122 is defined as a lens joint area 124, and the area outside the lens joint area 124 is defined as a...
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Abstract
The invention discloses an exposure machine, a method for forming a patterned film, a method for forming a patterned photoresist layer, an active element array substrate and a patterned film. The exposure machine is suitable for a photoresist layer on a film Exposure is performed to form a plurality of strip exposure patterns on the photoresist layer, and the exposure machine includes a light source, a lens group and a photomask. The lens group is arranged between the photoresist layer and the light source. The lens group includes a plurality of strip lenses arranged parallel to each other, wherein the overlapping area of any two adjacent strip lenses is defined as a lens joint area, and the lens joint area outside The area of is defined as multiple lens areas. The photomask is disposed between the photoresist layer and the lens group, wherein the photomask has a plurality of light-shielding patterns, the outer contours of the light-shielding patterns correspond to the strip-shaped exposure patterns, and each light-shielding pattern has a strip-shaped opening, and the strip-shaped The extending direction of the opening is substantially parallel to the extending direction of the light-shielding pattern.
Description
technical field [0001] The invention relates to an exposure machine, an array substrate, a patterned thin film, a patterned photoresist layer, and an exposure machine capable of exposing smaller spacings. Background technique [0002] As the display specifications of liquid crystal displays continue to develop towards large sizes, the performance requirements of the market for liquid crystal displays are high contrast (High Contrast Ratio), fast response, and wide viewing angles. In order to overcome the viewing angle problem of large-size liquid crystal display panels, The wide viewing angle technology of the liquid crystal display panel must also continuously improve and break through. Among them, the multi-domain vertical alignment mode (MVA mode) liquid crystal display panel is currently a relatively common wide viewing angle technology, such as the multi-domain vertical alignment mode (Multi-domain vertical alignment, MVA) liquid crystal display panel, Polymer Stabiliz...
Claims
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IPC IPC(8): G03F7/20G03F1/14G03F1/38
Inventor 萧祥志廖达文杨志敏陈珊芳张雅萍杨启宏廖崇源
Owner AU OPTRONICS CORP