Exposure machine, array substrate, patterned film, photoresist layer and formation method

Abstract

The invention discloses an exposure machine, a formation method of a patterned film, a formation method of a patterned photoresist layer, an active component array substrate and the patterned film, wherein the exposure machine is suitable for exposing the patterned photoresist layer on the film so as to form a plurality of strip exposure patterns on the patterned photoresist layer; the exposure machine comprises a light source, a lens group and a photomask; the lens group is arranged between the patterned photoresist layer and the light source; the lens group comprises a plurality of strip lenses which are arranged in parallel with each other; the overlap area of any two adjacent strip lenses is defined as a lens connection area; the area apart from the lens connection area is defined as a plurality of lens areas; the photomask is arranged between the patterned photoresist layer and the lens group and is provided with a plurality of shading patterns; the outlines of the shading patterns correspond to the strip exposure patterns; and each shading pattern is respectively provided with a strip opening, and the stretching direction of the strip opening is parallel to the stretching direction of the shading pattern substantially.

Description

technical field [0001] The invention relates to an exposure machine, an array substrate, a patterned thin film, a patterned photoresist layer, and an exposure machine capable of exposing smaller spacings. Background technique [0002] As the display specifications of liquid crystal displays continue to develop towards large sizes, the performance requirements of the market for liquid crystal displays are high contrast (High Contrast Ratio), fast response, and wide viewing angles. In order to overcome the viewing angle problem of large-size liquid crystal display panels, The wide viewing angle technology of the liquid crystal display panel must also continuously improve and break through. Among them, the multi-domain vertical alignment mode (MVA mode) liquid crystal display panel is currently a relatively common wide viewing angle technology, such as the multi-domain vertical alignment mode (Multi-domain vertical alignment, MVA) liquid crystal display panel, Polymer Stabiliz...

AI Technical Summary

Problems solved by technology

In this way, although the strip patterns formed by using the photoresist pattern as a mask have the same pitch (that is, the sum of the width and the interval is the same), they will have different width / spacing ratios, resulting in a polymer-stabilized alignment liquid crystal display. The display screen of the panel has the problem of bright and dark lines, which is the so-called lens mura (Lens mura)

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