Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Compatibility of auricularia polytricha cultivation material and method for preparing cultivation material

A technology of cultivation material and fungus, which is applied in the direction of fertilizer mixture, fertilization device, application, etc., can solve the problems of high hemicellulose content, poor feed palatability, and poor feeding effect, so as to achieve high yield and broaden the cultivation raw materials The effect of channels and reasonable ratio

Inactive Publication Date: 2013-08-07
邬金飞
View PDF5 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some dregs are currently used as roughage to feed animals. Due to the poor palatability of the feed and the high content of cellulose and hemicellulose, the feeding effect is very poor; except for some of the broad bean skins that are used as fuel, most of them are used as fuel. Dispose of as garbage, causing environmental pollution

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Compatibility of auricularia polytricha cultivation material and method for preparing cultivation material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] Method 1: In this example, the Auricularia auricula cultivation material includes the following components and mass ratio: 52% of broad bean skin, 25% of sawdust, 10% of sauce residue, 10% of vinegar grains, 2% of lime, and 1% of gypsum, all dry The sum of the mass and proportion of a substance is 100%.

[0023] Production Method:

[0024] ① Pre-wetting: Mix broad bean skin with sauce residue and vinegar residue dry material, and pre-wet with 2% lime water for 2 hours to keep the water content of the mixture at 50%-55%;

[0025] ② Mixing material: Add sawdust and gypsum dry material to the pre-wet mixture, stir evenly, then add water slowly, and mix well while adding, so as to keep the water content of the cultivation material at 63%-65%;

[0026] ③A high-pressure polyethylene bag tube with a folding width of 15cm, a length of 60cm, and a thickness of 0.05mm is used. The standard of the bacterial stick is the length of the material column (45±1)cm, and the weight of th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an auricularia polytricha cultivation material which is characterized in that brewery leftovers broad bean skins, residue of soya and vinegar residue are taken as major raw materials. The moisture content of the cultivation material ranges from 63% to 65%. The invention also provides a method for preparing the cultivation material. Compared with the conventional cultivation material, the auricularia polytricha cultivation material has the following advantages: 1, materials are obtained from local sources so that the production cost is greatly reduced, 2, the cultivation material is rational in proportioning and complete in nutrition, the hypha grows vigorously, and the auricularia polytricha is quick to emerge, good in spreading, deep in color and high in yield, and 3, the channel of the cultivation raw material is expanded and new source is developed for insufficient edible fungus raw materials. The auricularia polytricha cultivation material has the social benefit that the broad bean skins are used for substituting for sawdust so that a part of fungus-forest contradiction can be alleviated, and the residue of soya and the vinegar residue are used for substituting for bran so that the waste is utilized; and therefore, the auricularia polytricha cultivation material is advantageous for energy conservation and emission reduction.

Description

technical field [0001] The content of the present invention includes the compatibility of Auricularia auricula cultivation material and the preparation method of the cultivation material, belonging to the technical field of edible fungus cultivation. Background technique [0002] Auricularia auricula is one of the edible fungi with increasing demand in the international market, known as "jellyfish skin on wood". Auricularia auricula is rich in nutrition, and the total mass of amino acids in dry products is 4.68%, including 8 kinds of essential amino acids for human body, accounting for 42.31% of the total mass, and 9 kinds of other amino acids, accounting for 57.69% of the total mass. Auricularia auricula is used as medicine to benefit qi and strengthen the body, promote blood circulation, stop bleeding and relieve pain. [0003] Sauce residues, vinegar residues, and broad bean skins are leftovers from the brewery. Some dregs are currently used as roughage to feed animals....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C05G3/00
Inventor 邬金飞
Owner 邬金飞
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com