a film stand
A technology of film holders and bosses, applied in the field of film holders, can solve the problems of motor damage, adsorption surface pollution, chemical liquid being sucked into vacuum pipelines, etc.
Inactive Publication Date: 2018-11-09
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology
However, the traditional adsorption-type wafer holder is easy to pollute the adsorption surface, and the chemical liquid is also easy to be sucked from the vacuum suction hole to the vacuum pipeline, and even cause damage to the motor.
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Embodiment Construction
[0022] In order to better understand the above-mentioned technical solution, the above-mentioned technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.
[0023] Such as figure 1 As shown, the embodiment of the present invention provides a wafer stage for carrying and fixing a wafer 6. The wafer stage includes: wafer stage body 1, pillar 2, boss 3, air inlet hole 4 and air outlet hole 5 . There are at least three pillars 2 arranged on the upper surface of the wafer stage body 1 and distributed on the same circumference. At least three pillars 2 are used to stably support the wafer 6 . In this embodiment, four pillars 2 are adopted, and the pillars 2 are evenly distributed on the same circumference. The boss 3 is arranged on the upper surface of the wafer stage body 1 and is surrounded by the pillars 2. The height of the boss 3 is lower than the height of the pillars 2, so that the wafer 6 is onl...
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The invention relates to a wafer bearing stage, and belongs to the technical field of semiconductor and integrated circuit manufacture. The wafer bearing stage comprises a wafer bearing stage body, at least three pillars, a boss, a gas inlet and at least two gas outlets, wherein the pillars are arranged at the upper surface of the wafer bearing stage body and distributed in the same circumference; the boss is arranged at the upper surface of the wafer bearing stage body and surrounded by the pillars, and the height of the boss is lower than that of the pillars; the gas inlet is arranged in the bottom of the wafer bearing stage body; the gas outlets are arranged in the lateral side of the boss; and nitrogen gas is input to an air channel via the gas inlet and sprayed out via the gas outlets. The nitrogen gas is sprayed out via the gas outlets to from a moving gas flow, the pressure at the center of the wafer bearing stage is low, the pressure in the periphery is high, and thus, a wafer can be fixed on the wafer bearing stage; and at the same time, the nitrogen gas is input at the back side of the wafer, so that the back side of the wafer is prevented from pollution of chemical liquid.
Description
technical field [0001] The invention relates to the technical field of semiconductor and integrated circuit manufacturing, in particular to a chip holder. Background technique [0002] In the monolithic wet etching and cleaning process in the field of semiconductor and integrated circuit manufacturing, the wafer needs to be carried by the wafer table so that it can be rotated to complete the related process. The wafer holder can fix the wafer without polluting the wafer, especially the back side which is adsorbed. However, the traditional adsorption-type wafer holder is easy to pollute the adsorption surface, and the chemical liquid is also easily sucked from the vacuum suction hole to the vacuum pipeline, and even damages the motor. Contents of the invention [0003] The object of the present invention is to provide a wafer holder, which can protect the back of the wafer from being polluted by chemical liquid while fixing the wafer. [0004] In order to achieve the abov...
Claims
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IPC IPC(8): H01L21/683
CPCH01L21/6838
Inventor 陈波李楠夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI