Surface anisotropic morphology processing method based on electronic dynamic regulation

Abstract

The invention relates to a surface anisotropic morphology processing method based on electronic dynamic regulation, and belongs to the field of functional surface application. The effect that laser can vertically irradiate to the surface of a horizontally arranged sample is guaranteed. A slit is arranged in the position where a light path passes; the position of the slit is regulated; the width of the slit is regulated to the needed size; and the effect that the laser vertically passes through the center of the slit is guaranteed. The major-minor axis ratio of anisotropic morphology can be continuously adjusted through the width of the slit. Processing of the surface anisotropic micro-nano composite structure of materials is realized through a spatial light shaping method, so that the process of building an anisotropic structure is simplified, the surface anisotropic morphology processing method is suitable for various materials, and the major-minor axis ratio of the anisotropic structure is changed continuously by adjusting the width of the slit. The parameters such as the number of pulses, energy and the processing period are changed furthermore so that controllable changes of the anisotropic wetting property can be realized after large-area processing, and the simple, controllable and efficient processing method is provided for the anisotropic wetting property.

Description

technical field [0001] The invention relates to a method for processing anisotropic surface topography based on electronic dynamic control, belonging to the field of functional surface applications. Background technique [0002] Surfaces with anisotropic wetting properties can realize directional sliding of droplets, and have a wide range of applications in the fields of microfluidic channels, biosensors, and droplet directional transport. In order to achieve anisotropic wetting characteristics, it is necessary to construct a surface with anisotropic morphology, and specific processing methods include chemical vapor deposition, photolithography, and interferometry. The research group of Jilin University (WangS, WangT, GeP, et al. Controlling Flow Behavior of Waterin Microfluidics with a Chemically Patterned Anisotropic Wetting Surface. Langmuir, 2015) used chemical vapor deposition and chemical etching to obtain a substrate with a hydrophilic / hydrophobic stripe structure, wh...

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Problems solved by technology

The research group of Jilin University (WangS, WangT, GeP, et al. Controlling Flow Behavior of Waterin Microfluidics with a Chemically Patterned Anisotropic Wetting Surface. Langmuir, 2015) used chemical vapor deposition and chemical etching to obtain a substrate with a hydrophilic / hydrophobic stripe structure, which has anisotropic wetting characteristics, but using The processing technology of this method is complicated, the requirements on the processing environment are relatively high, and it may pollute the environment; the research group of the University of New Mexico (XiaD, BrueckSRJ. The groove structure with a controllable period has been processed, which can realize anisotropic wetting characteristics, but this method can only realize large-area processing of the array groove structure, and cannot control the processing shape; the research group of the Korean Academy of Science and Technology (JeonHC, JeonTY, YangSM.NanoarchitectureswithControllableAnisotropicFeaturesinStructuresandPropertiesfromSimpleandRobustHolographicLithography.ACSappliedmaterials&interfaces,2013) Using holographic lithography technology, by placing a prism directly above the processing material, adjusting the position of the prism to control the anisotropic structure, this method compares the collimation requirements of the processing optical path High, the adjustment of parameters is more complicated

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