30 results about "Slit width" patented technology

The utility model relates to the technical field of optical instruments, in particular to a two-dimensional adjustable optical slit device which comprises a base, two containing cavities are symmetrically formed in the base, and a partition plate is formed between the two containing cavities. A blade is arranged in each containing cavity, a rotating shaft transversely penetrates through the blades, positioning columns are arranged at the two ends of the rotating shaft, sliding grooves are formed in the front inner wall and the rear inner wall of each containing cavity, and the positioning columns are inserted into the sliding grooves and slide in the sliding grooves. The end, extending out of the sliding groove, of the positioning column is fixedly connected with a supporting plate, the supporting plate is connected with a sliding plate arranged on the base in a sliding mode, and the sliding plate is provided with a spiral micrometer head. The positioning column moves along the sliding groove to achieve large-range position adjustment, the spiral micrometer head is responsible for high-precision slit width control, transverse and tangential two-dimensional adjustment is achieved, efficiency and precision are both considered, the slit width and the center position can be simply and accurately adjusted, and the structure is simple and practical.

A hyperspectral imaging device includes an optical channel arranged to focus light at a first image plane. A spectrometer includes a slit formed at the first image plane to allow a slit-shaped portion of the light pass through. A dispersive element receives light from the slit and spectrally disperses it along a direction perpendicular to a width of the slit. A focusing lens focuses the spectrally dispersed light at a second image plane such that the spectral dispersion is imaged along a first axis thereof, and a spatial image of the slit width is imaged along a second axis for detection by a sensor. A sliding lens group between the optical channel and the first image plane moves to direct the incident light, scanning the entire image over the slit such that multiple frames acquired by the sensor each correspond to a horizontal line of the image.

This application provides a method for measuring the cross-sectional shape of photoresist. The method includes: Step S1: forming a photoresist layer on a substrate and performing a photolithography process; Step S2: measuring the patterned photoresist layer, determining whether the photolithography process was successful based on the measurement results; if not, removing the patterned photoresist layer and returning to Step S1; if yes, proceeding to Step S3: selecting a measurement area on the patterned photoresist layer, the measurement area having a repeating pattern to serve as a grating; Step S4: measuring the diffraction intensity of zero-order and first-order light at multiple wavelengths λ using a diffraction-based overlay error measurement method; Step S5: calculating the equivalent slit width a of the grating; Step S6: obtaining the cross-sectional shape of the patterned photoresist layer. This application utilizes the principle of grating diffraction, the diffraction-based overlay measurement technology, and mathematical calculations of diffraction intensity to obtain the cross-sectional shape information of the photoresist, thus eliminating the need for slicing and saving time and manpower resources.

The invention provides a pole piece slitting method, a controller and a pole piece slitting system. The pole piece slitting method comprises the following steps: firstly, acquiring width information of a wide pole piece to be slit at a first detection position so as to determine a standard slitting position corresponding to each slitting point based on the acquired width information and a preset slitting width number; obtaining the current position information of the wide pole piece to be slit at the second detection position, comparing the current position information with the preset position information, and determining the offset direction and offset of the wide pole piece to be slit in the moving process; and finally, the standard slitting position is adjusted in real time on the basis of the deviation direction and the deviation amount of the wide pole piece to be slit, so that when the wide pole piece to be slit deviates, the wide pole piece to be slit can still be precisely slit into a plurality of narrow pole pieces on the basis of the adjusted slitting position, the slitting precision of the laser slitting device is effectively improved, and the production efficiency is improved. The width tolerance of a plurality of narrow pole pieces is reduced, and the high-precision requirement required in the lithium battery manufacturing process is met.

The invention provides a spectrograph resolution control method and module and an in-situ monitoring system, and relates to the technical field of semiconductor detection.The spectrograph resolution control method comprises the steps that spectral data output by a spectrograph are obtained, the central wavelength value of the spectrograph is calculated, a preset relation model is inquired according to the central wavelength value and a preset target resolution, and the corresponding target slit width is obtained; and an adjustment instruction is sent to the motor, so that the motor adjusts the slit to the target slit width in the intermittent period when the spectrograph scans different wavebands, and then the current resolution of the spectrograph is adjusted to the target resolution. According to the application, the corresponding target slit width can be obtained according to the spectral data measured in real time, and the motor is driven to adjust the slit to the target slit width, so that the current resolution is adjusted, the resolution of the spectrometer in the epitaxial growth process is maintained at the target resolution, the measurement precision is improved, and the performance of a semiconductor device is stabilized.

The utility model belongs to the technical field of adjustable slits, and discloses an adjustable slit used in an optical path, which comprises a slit shell, a slit cover is arranged on one side of the slit shell, an adjusting rod is inserted in the outer side of the slit shell in a threaded manner, a handle is fixedly arranged at one end of the adjusting rod, a baffle is sleeved on the outer side of one end of the adjusting rod, and a light source is arranged on the baffle. Second-level positioning blocks are fixedly arranged on the inner walls of the two sides of the slit shell, first-level positioning blocks are fixedly arranged on the inner side of the slit shell, the inner sides of the first-level positioning blocks and the inner sides of the second-level positioning blocks are slidably attached to a baffle, a limiting groove is formed in the inner side of the baffle, a limiting plate is fixedly arranged at one end of the adjusting rod, and the outer side of the limiting plate is attached to the limiting groove. According to the utility model, through the baffle plate and the adjusting rod, the effective width of the light-passing slit can be changed by adjusting the position of the baffle plate so as to meet the adjusting requirements of different light paths on the width of the slit, and the structure adaptability is good, so that the light-passing slit can be well butted to a light path system.

The invention relates to the technical field of slit lamps, in particular to a slit light adjusting device and a motor auxiliary control method for slit width adjustment. The device comprises an illumination angle adjusting mechanism and a crack width adjusting mechanism. The crack width adjusting mechanism comprises a rotary knob, a transmission shaft, a rotary knob end gear, an encoder gear, an encoder and a crack opening and closing executing mechanism. The knob drives the knob end gear to rotate through the transmission shaft, the encoder gear is meshed with the knob end gear and installed on the encoder input shaft, a shared transmission path is formed, the knob rotates to be synchronously transmitted to the encoder, and signals of the encoder drive the opening and closing motor. The spring assembly is arranged below the encoder and pushes the encoder gear upwards to eliminate the meshing clearance. According to the device, the problem that a traditional manual structure lacks electric control cooperation is solved, through the common path and spring design, idle stroke is avoided, instant response and consistent hand feeling of bidirectional adjustment are ensured, and motor assistance, remote control and automatic calibration are supported.

The invention provides a slit type lithium niobate electro-optical modulator. According to the slit-type lithium niobate electro-optical modulator, the full-coverage silicon dioxide upper cover layer is designed and the thickness of the full-coverage silicon dioxide upper cover layer is regulated and controlled, so that the light field leakage loss in the optical waveguide is reduced, and meanwhile, the position is designed between the lithium niobate layer and the metal electrode structure layer, so that the absorption loss of metal is effectively reduced; secondly, the slit width and the slit thickness of the slit type optical waveguide structure are optimized, the effective mode area is reduced, and the transmission loss is further reduced; through the design of the special electric field regulation and control layer, the electric field is regulated and controlled while the light field leakage is reduced to a certain extent, so that the electric field intensity of the waveguide center is enhanced, and the loss reduction and the high modulation efficiency are finally realized; in the electro-optical modulator, structural optimization is carried out in three important aspects of microwave loss, microwave refractive index matching and impedance matching, and finally, low-loss, high-efficiency and large-bandwidth design is realized.

The utility model belongs to the technical field of grating inscribing, and discloses a light-transmitting slit device and grating inscribing equipment. The light-transmitting slit device comprises a slit base, two sliding blocks, two driving assemblies and a supporting assembly. The slit base is provided with a slit hole, and the light beam can pass through the slit hole. The two sliding blocks are connected to the slit base in a sliding mode in the first direction, the two sliding blocks can shield the slit hole, and a light-transmitting slit is formed between the two sliding blocks. The driving assemblies are in one-to-one correspondence with the sliding blocks, the driving assemblies are connected to the slit base, and the driving assemblies can drive the sliding blocks to slide in the first direction. The supporting assembly is connected to the slit base, and the supporting assembly can fix the slit base to the optical platform. The two sliding blocks are driven by the driving assembly to move in the direction close to each other, and the width of the light-transmitting slit is reduced. The driving assembly drives the two sliding blocks to move in the direction away from each other, the width of the light-transmitting slit is increased, and therefore adjustment of the width of the light-transmitting slit is achieved.

This application relates to the field of wave energy simulation technology and discloses a simulation method and system for dual-mode frequency tuning of oscillating water columns in a double-slit caisson. The method includes: establishing a two-degree-of-freedom dynamic equation system based on the displacements of the water columns in the front and rear cavities, using the slit transmission coefficient as a parameter to obtain the coupling stiffness; substituting the coupling stiffness into the eigenvalue equation to decompose the oscillation modes of the two cavities to obtain the mode transformation matrix and mode amplitude ratio; performing convolution integration on the mode amplitude ratio and the wave power spectrum of the target sea area to obtain the first-order mode weight and second-order mode weight; using a preset target first-order mode weight as the outer convergence target and a preset target natural frequency as the inner convergence constraint to perform a double-layer nested iterative solution on the slit transmission coefficient and the rear cavity volume to obtain the optimal slit width and the optimal rear cavity volume. This application solves the problem of unobservable and undesignable energy contribution ratios of each mode in existing technologies, leading to spectral mismatch.

An extrusion film-forming apparatus includes: a die that extrudes a molding material from a slit-shaped extrusion outlet; a die lip drive mechanism that changes a slit width of the extrusion outlet; and a control device that controls the die lip drive mechanism, in which during the extrusion of the molding material, the control device controls the die lip drive mechanism to temporarily decrease the slit width of the extrusion outlet for cutting the extruded molding material.

The application discloses a kind of width quadratic gradient light cathode design methods applied to stripe transmission grating spectrometer, comprising the following steps: step S1: with the center of light cathode base as origin (0,0) establishes rectangular coordinate system, light cathode slit length direction is defined as x-axis direction, and light cathode slit width direction is defined as y-axis direction;Step S2: light cathode slit edge coordinates comply with quadratic function and, step S3: establish zero-level center x-axis coordinate of silk.This application has the beneficial effects that: by using width quadratic gradient light cathode design, the signal intensity distribution of X-ray streak camera light cathode can be controlled, the signal intensity difference between high-energy region and low-energy region in transmission grating dispersion spectrum is reduced, and the problem of high dynamic range requirement for X-ray streak camera is solved.

The application provides a kind of gradually curved surface tapering optical waveguide wide-area spectrum acquisition coupling device and method, belongs to the optical technology field in front end of spectrum detection.The device includes wide-area light acquisition module, light flux compression and coupling module, multi-fiber parallel output module and mechanical support and coaxial alignment module;Wide-area light acquisition module contains big end input face, gradually curved surface tapering transition section and small end output face, for receiving wide-area spectrum radiation from spatial extended radiation source, and performing progressive spatial compression;Light flux compression and coupling module are used for shaping and converging the light beam;Multi-fiber parallel output module is used for remapping the light beam into linear light beam, and the shape of linear exit surface matches the incident slit;Mechanical support and coaxial alignment module are used for coaxially fixing each module.The application can efficiently capture and slit couple wide-area weak light signal without significantly increasing the slit width and system volume, and take into account spectral resolution and sensitivity.

The application discloses a resolution plate, a resolution test system and a method for measuring resolution capability, wherein the resolution plate comprises a plate body, at least one slit group is arranged on the plate body, the slit group comprises two parallel slits which are arranged on the plate body along a path, the slit has a width in a direction perpendicular to the path, the slit has a uniform width along the path, the two slits have a consistent shape and width, the two slits are arranged at intervals, and the interval of the two slits is equal to the width of the slit. By arranging at least one slit group with two slits on the plate body made of tungsten material, high-energy X rays can form at least one image with two strips on the imaging plate through the slit group, and the corresponding curve can be obtained through simple measurement and multiple tests, so that the resolution capability of the ray point source under the corresponding magnification ratio and the slit width can be intuitively and accurately reflected.

An insert device (1) for a lighting device, the insert device (1) comprising at least one side wall (21, 22) arranged along a bottom part (4) of said insert device (1) and extending from the bottom part (4) towards a top part (3) of said insert device (1), wherein the bottom part (4) is provided with an outer surface (5), and is configured to accommodate at least one light source (15) configured to, in operation, emit light away from the bottom part (4) through a light exit opening (6). The insert device (1) comprises the plurality of partition wall elements (9) arranged perpendicular the bottom part (4) of the insert device (1) along the side wall (21, 22), and configured to provide a plurality of consecutively arranged cavities (11) between the partition wall elements (9) and the side wall (21, 22) and the bottom part (4). The side wall (21, 22) delimit a respective slit (71, 72) having a slit bottom end (18) at or in the bottom part (4), and the slit (71, 72) is defined by a slit length and a slit width, and extends along the side wall (21, 22), such that the slit (71, 72) forms a holder for a reflective material sheet (81, 82).

This invention relates to the field of monochromator design technology, specifically providing a micro-motion slit assembly and monochromator for use in a monochromator. The slit plates of the micro-motion slit assembly are connected to a slit mounting plate and slidably connected to a slit base via a guide rail. A micrometer screw converts rotation into linear motion of a gap cone, and the gap cone adjusts the width of the slit between the two slit plates. The micrometer screw and gap cone enable large-range, high-precision adjustment of the slit width. This micro-motion slit assembly serves as both the output and input slit assemblies of the monochromator, and a vacuum transmission environment is provided by the housing. Spectral scanning or fixed-point wavelength output is achieved by rotating the beam splitter. This invention achieves continuous coverage of the entire 100-435nm wavelength band through vacuum design and improves the resolution adjustment accuracy of the monochromator's output light through the micro-motion slit design.

This invention discloses an automatic identification and error prevention system and method for slitting width, relating to the fields of industrial automation and intelligent manufacturing technology. It addresses the problems of inaccurate dynamic measurement of width and the inability to accurately locate and intercept out-of-tolerance causes during slitting production. First, a mapping matrix is ​​constructed by analyzing the manufacturing execution system work order to accurately bind production tasks to the underlying tool holder hardware. Then, the measurement units in the actual tool holder area are activated according to the mapping matrix, effectively shielding clutter signals from non-cutting areas. Next, by combining real-time traction tension analysis of the material's lateral elastic deformation, the target width is dynamically corrected to generate a real-time benchmark, and drift gradient features are extracted. Finally, by comparing the measured and benchmark data, the failure mechanism is precisely decoupled into mechanical faults or tension anomalies based on waveform abrupt changes, and targeted blocking commands are issued, thus constructing an intelligent error prevention system from identification to closed-loop interception.

A hyperspectral imaging system includes an optical channel arranged to focus light at a first image plane. A spectrometer includes a slit formed at the first image plane to allow a portion of the light to pass. A dispersive element receives light from the slit and spectrally disperses it along a direction perpendicular to a width of the slit. A focusing lens focuses the spectrally dispersed light at a second image plane such that the spectral dispersion is imaged along a first axis of the second image plane, and a spatial image of the slit width is imaged along a second axis. A sensor at the second image plane detects the spectrally dispersed light. A rotating prism is located distally to the slit and rotates, thereby rotating the image at the first imaging plane so that the portion of the image transmitted into the spectrometer varies.

The invention belongs to the technical field of spectral analysis, and particularly relates to a gas analysis device based on coaxial collection cavity resonance enhanced Raman scattering, which comprises a light incidence unit, a sample chamber unit, a Raman signal collection unit and a Raman spectrometer which are sequentially arranged along a light path, the light incidence unit is used for coupling a laser beam into the sample chamber unit; the sample chamber unit comprises a sample chamber and an FP cavity arranged in the sample chamber, and the sample chamber is used for introducing gas to be detected; the FP cavity comprises a first cavity mirror and a second cavity mirror; the Raman signal collecting unit comprises a collecting collimating lens, a dichroic mirror, a long-pass optical filter and a converging lens which are sequentially arranged along an emergent light path; an emergent light path is coaxial with an incident light path of the FP cavity; a circular small-aperture element coaxial with an emergent light path is arranged at a light inlet of the Raman spectrometer, the circular small-aperture element is positioned at an imaging point after the FP cavity fundamental mode beam waist passes through the collecting unit, the diameter of the circular small-aperture element is smaller than or equal to that of an FP cavity fundamental mode beam waist image, and the circular small-aperture element is matched with the slit width required by the resolution of the Raman spectrometer.

The application provides a kind of spectrometer resolution control method, module and in-situ monitoring system, it is related to semiconductor detection technical field, the application obtains the spectral data of spectrometer output, calculates its central wavelength value, according to central wavelength value and pre-set target resolution, inquires pre-set relationship model, obtains corresponding target slit width;Send adjustment instruction to motor, to make motor in the intermittent period of different waveband of spectrometer scanning, adjust slit to target slit width, and then adjust the current resolution of spectrometer to target resolution.The application can obtain the corresponding target slit width according to the real-time measured spectral data, and drive the motor to adjust the slit to the target slit width, thereby adjusting the current resolution, maintaining the resolution of the spectrometer during epitaxial growth at the target resolution, thereby improving the measurement accuracy and stabilizing the performance of semiconductor devices.

The application discloses a continuous high-precision composite slitting integrated machine, and relates to the technical field of composite film processing, which comprises an L-shaped base plate, a gas expansion winding shaft and a pair of gas expansion unwinding shafts are rotatably installed on the vertical surface of the base plate, and further comprises a slitting assembly, a T-shaped support, an electric telescopic rod and a mounting column; the slitting assembly can adjust the slitting width; the slitting assembly comprises a pair of guide horizontal shafts fixed on one side of the base plate, and a plurality of slitting units are slidably installed on the pair of guide horizontal shafts; the sleeve block is driven to move by the electric telescopic rod, the electrically-conductive clamp at the end of the L-shaped transmission rod is driven to slide along the spiral resistance wire, the resistance value change is fed back to the controller in real time, a plurality of slitting units are synchronously slid on the guide horizontal shafts in combination with the cross-brace linkage, and the continuous and accurate adjustment of the slitting width is realized; meanwhile, when the slitting width of the composite film is reduced, the movement of the electrically-conductive clamp reduces the resistance, the power of the cold press roller is improved, the bonding force of the composite film is strengthened, and the slitting edge lifting is reduced.

The invention discloses a tunnel face peripheral hole shaped charge blasting device and a blasting quality evaluation method, and belongs to the technical field of tunnel engineering blasting construction. The device comprises a three-slit shaped charge pipe (the diameter of a copper pipe is 45 mm, the slit width is 4.5 mm, and the included angle of three slits is 90 degrees) and a special-shaped charge structure (the diameter of a PVC pipe is 40 mm, the PVC pipe is provided with an energy-gathering groove, and the groove angle is 60 degrees), emulsion explosives and a digital electronic detonator are fixed through bamboo chips, a middle slit vertically faces the inner side of an excavation contour line, and multi-directional stress wave superposition control is achieved. After blasting, data are collected based on technologies such as a section laser range finder and a vibration sensor, a multi-dimensional evaluation system containing geometric indexes (the back break distance, the half-hole rate and the section fractal dimension) and safety indexes (the damage PPV value and the surrounding rock quality score) is constructed, an improved AHP-entropy weight combination weighting method is adopted for calculating the weight, and the blasting quality grade is determined through a confidence coefficient rule.

The present disclosure provides a micron-level electric continuous adjustable slit device and optical device, belonging to the technical field of adjustable slit. The device comprises a mounting plate and a slit adjusting mechanism mounted on the side wall of the mounting plate. The slit adjusting mechanism comprises: a first guide rail and a second guide rail, which are parallel to each other and movably arranged on the side wall of the mounting plate; a first slit blade and a second slit blade, which are parallel to each other and symmetrical, one of which is arranged on the first guide rail and the other is arranged on the second guide rail; a lead screw motor arranged on one side of the mounting plate; the lead screw motor drives the first guide rail and the second guide rail to move in opposite directions along the axis of the mounting plate through a transmission assembly, so as to drive the first slit blade and the second slit blade to move in opposite directions, and adjust the slit distance between the first slit blade and the second slit blade. The micron-level electric continuous adjustable slit device and optical device realize high-precision continuous bidirectional adjustment of the slit width.

According to the present invention, an application device comprises a die head 20 for applying a slurry 13. The die head 20 has a slit 21 that has an opening through which the slurry 13 is discharged. At the opening of the slit 21, the slit width W2 at both ends in the longitudinal direction of the slit 21 is up to 20% greater than the slit width W1 at the center in the longitudinal direction of the slit 21.

The invention relates to a front collimator and scanning imaging equipment. The front collimator comprises a shading assembly which comprises a first shading piece and a second shading piece which is arranged side by side with the first shading piece at an interval, and a collimation slit is formed between the first shading piece and the second shading piece; the driving assembly comprises a first transmission part connected with the first shading piece, a second transmission part connected with the second shading piece and a driving part connected with the first transmission part and the second transmission part; the driving part synchronously drives the first shading part and the second shading part through the first transmission part and the second transmission part respectively to perform linear motion in opposite directions so as to enable the first shading part and the second shading part to be close to each other or away from each other, so that the width of the collimation slit is adjusted. The front collimator provided by the embodiment of the invention has a structure capable of adjusting the width of the collimation slit, so that the width of the collimation slit can be adjusted according to actual application conditions, and the scanning thickness can be changed. The front collimator is high in universality and adaptability, the overall operation is simple and convenient, the working efficiency is improved, and the use cost is reduced.

The application relates to the technical field of semiconductor optoelectronic device integration, and provides a multi-mode interference coupler internal beam splitting device, a core layer high-refractive index waveguide is embedded in a low-refractive index cladding layer, and the core layer comprises an input straight waveguide, a tapered input waveguide, a multi-mode interference region, an air slit, a tapered output waveguide and an output straight waveguide which are sequentially connected. The tapered input waveguide is connected with one end of the multi-mode interference region, and the tapered output waveguide can be connected with multiple positions of the multi-mode interference region according to use requirements. The application adds a 45-degree air slit at an MM I image point, realizes light emission in horizontal and vertical directions, and different slit widths have different beam splitting ratios. The beam splitting device provided by the application avoids adding other devices for changing the light path direction and the beam splitting ratio outside the MM I, reduces the loss of the whole integrated device, makes the whole device more compact, and improves the overall performance and stability.

The present invention relates to an apparatus for coating a dry film (003) onto a web-shaped carrier substrate (006), the apparatus comprising at least one first application unit (101) comprising a first roller (102) and a second roller (103) that rotates in the opposite direction to the first roller (102) and forms a first gap (104) with the first roller, the apparatus further comprising a first pressing roller (103'; 106) that, together with the second roller (103) or another roller disposed between the first pressing roller (103'; 106) and the second roller (103), forms a second gap (107) through which a substrate path for the carrier substrate (006) to be coated is guided, and the apparatus comprising a measuring device (413) for measuring the basis weight (FG) of the dry film (003), the measuring device comprising sensor elements (413.1; 413.2). An adjustment drive device (109; 111) is provided for adjusting the slit width (b104) of the first slit (104) and / or for adjusting the first roller (102; 103) toward the second roller (103), and a drive mechanism (148; 149) is provided for at least rotating the first roller or the second roller (102; 103) to drive it, wherein the sensor element (413.1; 413.2) of the measuring device (143) serves as an adjustment loop (R) for adjusting the weight (FG). FG ;R' FG The components of the device are connected to a control and / or adjustment device (156) which is configured to: change the slit width (b104) of the first slit (104) based on the weight (FG) determined by the measuring device (143), via a signal connection with the drive mechanism (132; 155) of the adjustment drive device (109; 111), and / or change the ratio between the circumferential speed V (102) of the first roller (102) and the circumferential speed V (103) of the second roller (103) via a signal connection with the drive mechanism (148; 149) of the first roller (102; 103). Additionally, the present invention relates to a method for coating a dry film (003) onto a web-shaped carrier substrate (008).

The utility model discloses a slit device for an optical instrument, which comprises a base, the base is L-shaped, the bottom of the base is fixedly connected with a slit plate, the two sides of the slit plate are L-shaped, the front end face of the slit plate is provided with a positioning groove, the center of the bottom of the positioning groove is provided with a slit opening, the positioning groove is internally provided with an adjusting plate, and the adjusting plate is fixedly connected with the slit plate. A plurality of light holes are formed in the surface of the adjusting plate, limiting pipes are arranged at the two ends of the adjusting plate in a sleeving mode, fixing blocks are fixedly connected between the limiting pipes and the slit plate, a top cover is installed at the top of the base, and a plurality of dehumidifying frames are fixedly connected to the bottom of the top cover. According to the utility model, the slit width of the optical instrument can be rapidly adjusted without a complex mechanical structure, the manufacturing cost of the device is greatly reduced, the response time is effectively shortened, the real-time dynamic optical measurement requirement can be met, and the dustproof and moistureproof performance is good.

The wavelength selector comprises an input device, a transmission device, an interference device and a selection device which are sequentially arranged along a light path, wherein the input device comprises an input port and a hollow ball which are arranged in sequence; the transmission device comprises an optical fiber and a lens; the interference device comprises a first reflecting mirror, an arc-shaped column and a second reflecting mirror which are sequentially arranged along a light path; the selection device comprises a diffraction grating and an output port, the gap width of the diffraction grating is adjusted through a driving device, and the driving device is controlled by the control device; the input port and the optical fiber are arranged at the two ends of the hollow ball, and the input port is not right opposite to the optical fiber. The slit width of the diffraction grating can be adjusted through the driving device, so that the light beam with the preset wavelength can be selected.

The invention relates to the technical field of laser processing, in particular to a laser grooving line light spot width control device and method.The laser grooving line light spot width control device comprises a laser used for emitting laser beams; the slit is arranged on a light path of the laser beam, has a fixed physical slit width and is used for intercepting the laser beam, and the slit width of the slit is kept unchanged in the process of adjusting the width of the linear light spot; the imaging adjusting module is located on the light path behind the slit and used for conducting optical imaging on the slit to form a middle line light spot image with the variable width, and the imaging magnification of the imaging adjusting module is adjustable; the focusing module is located behind the imaging adjusting module and used for focusing the middle line light spot image to the surface of a workpiece to be machined, and a line light spot used for grooving is formed. According to the scheme, the energy utilization rate can be kept constant, meanwhile, accurate and continuous regulation and control of the linear light spot width are achieved, the diffraction effect is effectively restrained, and the grooving quality is improved.