Slit adjusting device capable of adjusting slit width in double directions

An adjustment device and two-way adjustment technology, applied in the direction of measuring devices, instruments, scientific instruments, etc., can solve the problems of poor processing technology, complex mechanical structure, difficult assembly, etc., and achieve simple and beautiful appearance, simple device structure and low cost Effect

Inactive Publication Date: 2010-12-15
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF7 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems of complex mechanical structure, poor processing technology, large size, difficult assembl...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Slit adjusting device capable of adjusting slit width in double directions
  • Slit adjusting device capable of adjusting slit width in double directions
  • Slit adjusting device capable of adjusting slit width in double directions

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0015] Specific implementation mode 1. Combination Figure 1 to Figure 4 Describe this embodiment, a slit adjustment device that can adjust the slit width bidirectionally, including an adjusting screw 1, a first slit blade 2, a second slit blade 3, a main body base 4 and a support plate 10; it also includes two To the guide vane 6, tension spring 7 and thrust bearing 9; one end of the guide vane 6 is set to a stepped shape, and the other end is fixed on the main body base 4, the first slit blade 2 and the second slit blade 3 Both ends are respectively processed into a stepped shape, the first slit blade 2 and the second slit blade 3 are arranged between two pairs of guide vanes 6, the two ends of the first slit blade 2 and the second slit blade 3 The stepped shape matches the stepped shape provided at one end of the two pairs of guide vanes 6; the two ends of the first slit blade 2 and the second slit blade 3 are respectively symmetrically arranged with two fixing screws 11, a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a slit adjusting device capable of adjusting slit width in double directions, which relates to the technical field of optical precision machinery and solves the problems of complex mechanical structure, poor processing manufacturability, large size, assembly difficulty and high cost of the conventional device capable of adjusting the slit. The device comprises an adjusting screw, two slit blades, a belt main body base, an upper cover, guide vanes, a tension spring, a thrust bearing and a supporting plate. The symmetrically arranged guide vanes are adopted so as to ensure linear motion of the slit blades; the two blades are connected by adopting a thin steel wire going around a small pulley so as to ensure the symmetry of the two blades moving in opposite directions; and a pre-tightening force is applied to the two blades by adopting the tension spring so as to ensure the tension of the steel wire and eliminate crawl and backlash errors of a screw. The device has the advantages of easy processing and manufacture, low cost, capability of ensuring bidirectional adjustment, simple and convenient installation and large slit width adjusting range. The device is applicable in the precision machinery processing field.

Description

technical field [0001] The invention relates to the technical field of optical precision machinery design and processing, in particular to a simple and applicable small slit device that can be used for adjusting the luminous flux of an integrating sphere, or other optical instrument systems require that the slit width can be adjusted bidirectionally. Background technique [0002] In the field of optical instrument application technology, a slit refers to a gap formed by a pair of partitions on the optical path, which determines the luminous flux of the incident beam, thereby controlling the intensity of the outgoing beam and acting as a stop. If the optical instrument requires that the output light intensity can be adjusted as required, an adjustable slit should be used. [0003] The parallelism, symmetry, uniformity of opening and closing, and slit width of the slit opening have important influence on the performance of the slit. The current slits mainly include the follow...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01J3/04
Inventor 倪明阳巩岩张巍赵磊王学亮袁文全
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap