Moisture liquid phase sampler with eccentric hole plate

Abstract

The invention relates to a moisture liquid phase sampler with an eccentric hole plate. The moisture liquid phase sampler comprises a sampling pipeline main path 1, a sampling U-shaped loop 5 and a liquid phase sampling bottle 7, wherein the sampling pipeline main path 1 is connected onto a moisture circulation pipeline; the eccentric hole plate 2 is fixed on the sampling pipeline main path 1; the center of the hole is positioned above the center axial line of the main pipeline; an inlet and an outlet of the sampling U-shaped loop 5 are respectively positioned in the two sides of the eccentric hole plate of the sampling pipeline main path 1; the liquid phase sampling bottle 7 is positioned under the U-shaped loop 5, and is connected with the sampling U-shaped loop 5 through a switch valve; a three-way valve structure is arranged in positions of an inlet position and an outlet position of the sampling U-shaped loop 5 and in a position among the inlet and outlet of the sampling U-shaped loop 5 and the liquid phase sampling bottle 7. The moisture liquid phase sampler has the characteristics that the structure is simple; the efficiency is high; meanwhile, the dynamic sampling in the moisture flowing process is realized; the sampled liquid phase samples have good representativeness.

Description

technical field [0001] The invention belongs to the technical field of flow measurement of wet gas multiphase flow, and relates to a liquid phase sampler with an eccentric orifice plate. Background technique [0002] Moisture widely exists in nature and industrial processes, such as petroleum, chemical industry, metallurgy, nuclear energy, aerospace and other fields. In recent decades, with the rapid development of traditional industries and emerging industries, people have put forward higher and higher requirements for the measurement of moisture multiphase flow. As we all know, the flow pattern of moisture is very complex. Among the moisture flow patterns in horizontal straight pipes—stratified flow, wavy flow, annular flow, mist flow, and annular mist flow, the most representative ones are, at the same time The flow pattern that is also the most difficult to measure is annular mist flow. Affected by gravity, there are differences in the spatial distribution of the liqui...

AI Technical Summary

Problems solved by technology

Practice has proved that the design purpose of the gas-liquid isolation tank is to realize the isolation and sewage of gas and liquid. Although a certain amount of liquid can indeed be stored in the chamber of the small isolation tank under working conditions, the liquid is retained in a similar dead zone for a long time. In the space, when the composition of the liquid in the pipeline changes, it cannot follow the change, and it is not representative of the flowing fluid, that is, it cannot represent the real situation of the flowing liquid in the pipeline, and the representativeness of the liquid sample is poor

[0004] Chinese patent ZL2012104640258 discloses a wet gas two-phase flow measurement device with a gas-liquid isolation pressure collector with an annular chamber. Practice has proved that the patent is better than the patent ZL 2008 1 0151346.6 in the effect of gas-liquid isolation, and the pressure measurement The stability is better, and it can be drained synchronously with the main pipeline of the measuring device. However, for the same reason, because the liquid in the isolated pressure gauge stays in the annular chamber for a long time, it is also not representative of the flowing liquid, that is, the liquid sample poor representation

[0005] The purpose of the above two patent designs is to realize the isolation of gas and liquid, which is designed to facilitate the stability of the pressure signal in the moisture measurement. The liquid in the tank has the disadvantage of poor liquid sample performance; in addition, due to the volume of the isolation tank Smaller, the amount of liquid stored is small, and cannot meet the sampling requirements

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