A method for increasing the high temperature thermoelectric potential of layered cobalt-based oxide films
A technology of oxide thin film and thermoelectric potential, which is applied in the direction of coating, metal material coating process, ion implantation plating, etc., can solve the problems of reduced electrical conductivity, little improvement effect, and decline, so as to increase high temperature thermoelectric potential Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0017] The method for increasing the high-temperature thermoelectric potential of the layered cobalt-based oxide film described in this embodiment specifically includes the following steps:
[0018] (1) LaAlO tilted at 5° 3 (001) The single crystal substrate was first annealed in air atmosphere at 1000°C for 1 hour, then treated with acetone, alcohol and deionized water in an ultrasonic cleaner at room temperature for 2 minutes each, and then secondly annealed in air atmosphere at 1000°C Anneal 1h.
[0019] (2) Using pulsed laser deposition technology, the KrF excimer laser with a wavelength of 248nm and a pulse width of 28ns was used as the light source, with a laser energy of 175mJ, a laser frequency of 5Hz, and a background vacuum of 1×10 -3 Pa, growth temperature 780°C, flowing oxygen pressure 30Pa, growth time 5min is the growth process, and Ca is grown on the single crystal substrate obtained in step (1). 3 co 4 o 9 film.
[0020] The schematic diagram of the epitax...
Embodiment 2
[0022] The method for increasing the high-temperature thermoelectric potential of the layered cobalt-based oxide film described in this embodiment specifically includes the following steps:
[0023] (1) LaAlO tilted by 10° 3 (001) The single crystal substrate was first annealed in air atmosphere at 950°C for 2 hours, then treated with acetone, alcohol and deionized water in an ultrasonic cleaner at room temperature for 2 minutes each, and then secondly annealed in air atmosphere at 950°C Anneal 2h.
[0024] (2) Using pulsed laser deposition technology, the KrF excimer laser with a wavelength of 248nm and a pulse width of 28ns was used as the light source, with a laser energy of 200mJ, a laser frequency of 4Hz, and a background vacuum of 1×10 -3 Pa, growth temperature of 780°C, flow oxygen pressure of 30Pa, and growth time of 7.5min are the growth process. Ca is grown on the single crystal substrate obtained in step (1). 3 co 4 o 9 film. The thermoelectric potential S≈550μ...
Embodiment 3
[0026] The method for increasing the high-temperature thermoelectric potential of the layered cobalt-based oxide film described in this embodiment specifically includes the following steps:
[0027] (1) LaAlO tilted at 30° 3 (001) The single crystal substrate was annealed once in air atmosphere at 1150°C for 0.5h, and then treated with acetone, alcohol and deionized water in an ultrasonic cleaner for 2min at room temperature, and then in air atmosphere at 1150°C for a second time. Second annealing 0.5h.
[0028] (2) Using pulsed laser deposition technology, the KrF excimer laser with a wavelength of 248nm and an excitation pulse width of 28ns was used as the light source, with a laser energy of 250mJ, a laser frequency of 3Hz, and a background vacuum of 1×10 -3 Pa, growth temperature of 780°C, flow oxygen pressure of 30Pa, and growth time of 10min are the growth process, and Ca is grown on the single crystal substrate obtained in step (1). 3 co 4 o 9 film. The thermoelect...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 
