Mask plate deflection detecting device, adjusting device and detecting and adjusting method

A technology of detection device and adjustment device, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of large sag bending deflection, poor color mixing, uncontrollable sag bending deflection of mask plate, etc. Generate shadows, improve product yield, and reduce poor color mixing effects

Active Publication Date: 2018-02-02
BOE TECH GRP CO LTD +1
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] With the expansion of the size of the glass substrate, the size of the metal mask device is required to gradually expand, and the metal mask is generally very thin, and the sagging and bending deflection in the middle of the mask cannot be controlled during the evaporation process, and during the evaporation process When the mask plate is heated and expanded, its sagging and bending deflection will become larger, so that there is a gap between the mask plate and the glass substrate, and the gap is easy to be mixed with evaporation materials to produce shadows, affecting the quality of evaporation and finally affecting the display effect of the display panel. The reaction is in Poor color mixing in OLED products
[0004] There will be a magnetic partition above the mask in the existing evaporation machine to resist the sagging of the metal mask due to gravity, but the size of the sagging bending deflection cannot be judged during the evaporation process, so each evaporation can only rely on It is not possible to accurately adjust the magnetic force of the magnetic separator by using empirical values ​​to determine the adsorption force of the magnetic separator used. In this way, the evaporated products are likely to cause poor color mixing due to improper adjustment of the magnetic force, especially the development of new products. There is no exact empirical value for reference, and the final evaporation effect is even worse

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate deflection detecting device, adjusting device and detecting and adjusting method
  • Mask plate deflection detecting device, adjusting device and detecting and adjusting method
  • Mask plate deflection detecting device, adjusting device and detecting and adjusting method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0047] Please refer to figure 1, the mask plate deflection detection device provided by the embodiment of the present invention is used to detect the sagging deflection when the mask plate 2 evaporates the glass substrate 1, including: two optical path members 3, and the two optical path members 3 are arranged close to the mask plate 2 Both ends of the lower surface, the inside of the optical path member 3 has a plurality of reflective surfaces 31, and the two...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a mask plate deflection detecting device, adjusting device and a detecting and adjusting method. The situation that evaporation shadow is generated due to the mask plate droopswhen the mask plate is evaporated to display a base plate is relieved, the yield of a display panel is improved, and the display efficiency is improved. The mask plate deflection detecting device comprises a light emitter, a light receiver, a light path adjusting mechanism and two light path components. The two light path components are arranged at the two ends of the surface of the lower side ofa mask plate in a tightly-attached mode. The interior of each light path component is provided with a plurality of reflector surfaces. The two light path components form a light path channel on the lower side surface of the mask plate. When the mask plate droops to generate deflection, the optical path channel is partially or completely blocked. The light emitter is used for transmitting detecting light to the light path channel. The light receiver is used for receiving the detecting light. The light path adjusting mechanism is installed on the two light path components and used for adjustingthe detecting light in the light path channel to be not obscured.

Description

technical field [0001] The invention relates to the field of display panel evaporation technology, in particular to a mask plate deflection detection device, an adjustment device, and a detection and adjustment method. Background technique [0002] In OLED (Organic Light Emission Display, organic electroluminescent diode) manufacturing technology, vacuum evaporation using a mask plate is a key process, and the effect of mask plate evaporation directly affects the production cost and product quality. At present, the more mature technology is to use vacuum evaporation technology. During the OLED evaporation process, organic materials will be deposited on the substrate above the evaporation source to form a unique pattern. There are pre-designed and typed openings on the stencil, and finally the organic material will pass through the opening area on the mask and be deposited on the glass substrate. [0003] With the expansion of the size of the glass substrate, the size of the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/04C23C14/24C23C14/54
CPCC23C14/042C23C14/24C23C14/54
Inventor杨忠英吴建鹏
OwnerBOE TECH GRP CO LTD