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Method for separating zirconia and hafnium oxide mixture

A mixture, hafnium oxide technology, applied in the direction of improving process efficiency, can solve the problems of cumbersome separation steps and high temperature

Active Publication Date: 2020-02-21
安徽唯安科技新材料发展有限公司
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  • Claims
  • Application Information

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Problems solved by technology

However, the above method still has the disadvantages of complicated separation steps and high temperature required for separation.

Method used

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  • Method for separating zirconia and hafnium oxide mixture
  • Method for separating zirconia and hafnium oxide mixture

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Embodiment Construction

[0021] The purpose of the present invention and its advantages in structure and function will be described based on the structure shown in the following drawings with specific embodiments, so as to have a deeper and more specific understanding of the present invention.

[0022] First, see figure 1 and figure 2 , the present invention is a method for separating a mixture of zirconia and hafnium oxide, which comprises the following steps:

[0023] Step 1 (S1): Zirconia (ZrO 2 ) / Hafnium Oxide (HfO 2 ) mixtures with halocarbons (X (2n+1) C n -CX 3 ) was reacted at 550°C for one hour to obtain zirconium tetrahalide (ZrX 4 ) / hafnium tetrahalide (HfX 4 ) mixture, its reaction formula can be, for example:

[0024] ZrO 2 +HfO 2 +X (2n+1) C n -CX 3 =ZrX 4 +HfX 4 +CO+CO 2 ; wherein the halogen (X) is bromine (Br) or iodine (I), and n is 0, 1 or 2; preferably, the zirconium oxide / hafnium oxide mixture can be obtained, for example, from baddeleyite (ZrO 2 ) and / or zircon...

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Abstract

The invention relates to a method for separating ZrO2 and HfO2 mixtures. The method comprises the following steps: firstly, reacting the ZrO2 / HfO2 mixture with halocarbon at 550 DEG C for 1 h to obtain a ZrX4 / HfX4 mixture; adding the ZrX4 / HfX4 mixture to a sublimation rectification tower (with a tower height of 5 m, a pressure of 1*104-1*10-6 torr, and a temperature of 500-150 DEG C) for rectifying for two hours to separate so that HfX4 is collected from the top of the tower and ZrX4 is collected from the bottom of the tower; and respectively replacing the collected ZrX4 and HfX4 by magnesiumto obtain pure Zr and pure Hf. The method provided by the invention has advantages of low environmental pollution, easy temperature control and simple separation step.

Description

technical field [0001] The invention relates to a method for separating a mixture of zirconia and hafnium oxide, in particular to a method for separating zirconia and hafnium oxide by low-temperature vacuum, which has the advantages of low environmental pollution, easy temperature control and simple separation steps. Background technique [0002] Zirconium (Zr) and hafnium (Hf) metals have special properties, such as high temperature resistance, radiation resistance, and corrosion resistance, so they are widely used in nuclear energy industry, chemical industry, metallurgy, electronics and other fields. The zirconium ore isolates of zirconium in the earth's crust are mainly badley zircon (ZrO 2 ) and zircon (ZrSiO 4 ) exists in the form of hafnium, but there is no separate mineral for hafnium, and it always coexists with zirconium in nature, and there is no separate hafnium ore. The content of hafnium in natural zirconium ore is generally 2-3 wt%, and the content of hafniu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22B34/14C22B3/44C22B3/22C22B3/46
CPCC22B3/22C22B3/44C22B3/46C22B34/14Y02P10/20
Inventor 叶安祺
Owner 安徽唯安科技新材料发展有限公司
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