A method for improving the uniformity of laser patterning

A uniform and patterned technology, applied in the field of laser applications, can solve the problems of shaping the speckle noise of the light field and affecting the uniformity of the laser processing pattern, so as to reduce the speckle noise and improve the uniformity and surface quality.

Active Publication Date: 2019-12-13
BEIJING INSTITUTE OF TECHNOLOGYGY
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problem that there is speckle noise in the above-mentioned shaping light field, which affects the uniformity of laser processing patterns, and provides a method for improving the uniformity of laser patterning processing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for improving the uniformity of laser patterning
  • A method for improving the uniformity of laser patterning
  • A method for improving the uniformity of laser patterning

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] The shaped processing light source can be any coherent laser, including continuous laser, nanosecond / picosecond / femtosecond laser and other pulsed lasers. In this example, femtosecond laser is used as the shaped processing light source. as attached figure 1 As shown, the specific steps of this example are as follows:

[0024] (1) Pixelate the letter "B" of the target shaping light field into a matrix A consisting of 50×50 elements 0 , and then select the number of intervals N=2, split the target reshaping light field into 4 sub-light fields A by the method of interlaced splitting 1,1 、A 1,2 、A 2,1 、A 2,2 (in the attached figure 1 In , for the clarity of the picture, the four sub-light fields are represented by serial numbers 1, 2, 3, and 4, respectively).

[0025] (2) Using the Fourier iterative algorithm based on Fresnel diffraction, taking each sub-light field as the target light field, and calculating the holographic phase maps corresponding to the four sub-lig...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method for improving the laser patterning processing uniformity, and belongs to the technical field of laser application. According to the method for improving the laser patterning processing uniformity, a to-be-processed pattern is disassembled into a series of sub-patterns by adopting an interlacing splitting method, a phase diagram of each sub-pattern is calculate according to a Fourier iterative algorithm, then the phase diagrams are sequentially loaded into a spatial light modulator to obtain shaping light fields, the sub-pattern corresponding to each shaping light field is processed on a material by using the shaping light fields, and the sub-patterns are finally combined into the complete processing pattern. In this way, the problem of uneven energy deposition caused by spot noise of the light field when a single phase diagram is adopted for carrying out laser space light field shaping processing is solved, and then the purpose of improving the laser patterning processing uniformity is achieved. The method is simple in principle, the uniformity of a processing result is remarkably improved, and the method has strong practicability; and the method for improving the energy deposition uniformity by performing interlacing splitting on the to-be-processed pattern can play an important role in laser space light field shaping and patterning processingbased on the spatial light modulator.

Description

technical field [0001] The invention relates to a method for improving the uniformity of laser patterning processing, which belongs to the technical field of laser applications. [0002] technical background [0003] Phase-type liquid crystal spatial light modulators are widely used in laser patterning as a light field shaping element. The premise of using phase liquid crystal spatial light modulator to shape the laser beam is to calculate the holographic phase map of the shaped light field by iterative algorithm. However, in the phase diagram generated by calculation, the phases between adjacent pixel points are often discontinuous, so that random interference occurs between adjacent light points in the actual reshaped light field due to different phases. Where interference cancellation occurs, dark spots (points with weak light intensity) will appear in the shaped light field, forming speckle noise. The existence of speckle noise reduces the uniformity and integrity of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/48B23K26/06G03H1/32
CPCB23K26/06
Inventor 姜澜李晓炜王志鹏
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap