Supercharge Your Innovation With Domain-Expert AI Agents!

Pico optical comb, manufacturing device and manufacturing method of pico optical comb

一种制造装置、曝光装置的技术，应用在照相制版工艺曝光装置、微光刻曝光设备、图纹面的照相制版工艺等方向，能够解决不能提供皮米量级测量基准、不能提供不同光栅差值等问题

Active Publication Date: 2021-06-01
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially prior art 3 is undoubtedly very important for the development of large-scale precision measurement technology, in which the width of all grid grooves is assumed to be uniform, on the order of hundreds of nanometers, but from the perspective of a single groove shape, it cannot Provide measurement benchmarks on the order of picometers
[0006] We can intuitively understand that although prior art 1, 2, or 3 all provide period measurement with picometer accuracy, they cannot provide the difference between different gratings

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pico optical comb, manufacturing device and manufacturing method of pico optical comb
  • Pico optical comb, manufacturing device and manufacturing method of pico optical comb
  • Pico optical comb, manufacturing device and manufacturing method of pico optical comb

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] Assuming that the picometer comb is produced by two holographic exposures, the manufacturing process using holographic double-beam exposure is as follows: figure 1 As shown, the period of the grating 105 for the first exposure is d, and the period of the grating for the second exposure is d+Δd. If the second exposure and the development process are matched, the opening ratio of the second exposure grating is f1=f2= 0.5 (here the aperture ratio is defined as the ratio of the gate groove to the period), it will produce as figure 2 The picometer optical comb with continuously variable grating pitch shown in the figure, its change process in a complete picometer optical comb period N·d is as follows figure 2 shown.

[0085] Here, the aperture ratios f1 and f2 are related to the amount of secondary exposure, the degree of development, and the like. The specific numbers of f1 and f2 can be calibrated in advance by setting the relationship between exposure amount and devel...

Embodiment 2

[0088] The picometer comb may also have larger f1 and f2 caused by two exposures, such as Figure 4 As shown, at this time, there may be only one slot-shaped distribution in one cycle, for example, 411, 412, etc., and two distributions may also appear, for example, 42M and 41M appear in one cycle, which shows that both f1 and f2 In larger cases, there may be a frequency doubling effect of the picometer comb. Finally, there may be a situation where the groove width of 42N2 and 42N1 gradually increases.

Embodiment 3

[0090] It is also possible for the picometer comb to have small f1 and f2, such as Figure 5 shown. For example, f1

[0091] Of course, for the distribution of f1 and f2 in other situations, there are more possibilities.

[0092] Since we can accurately measure the periods of the first and second exposures, reaching the picometer level, through the second exposure technology and changing the period of the second exposure, by setting the difference between the grating periods during the two exposures , the precise groove shape distribution of the picometer optical comb can be obtained, wherein the width of each groove shape is relative to the groove shape of the adjacent period, and the differenc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A kind of manufacturing device and manufacturing method of pico optical comb and pico optical comb. Compared with the gate groove, there is a fixed difference, such as Δd, and the difference Δd can be from picometer to nanometer. The pico-comb of the present invention will provide a benchmark for pico-meter measurement. The pico optical comb will generate a diffractive light field distribution different from the traditional grating, which will bring new diffraction effects, realize new diffractive optical functions, and provide tools such as pico lithography, pico measurement, and pico imaging, so , picometer optical combs will play an important role in many fields such as semiconductor lithography, life sciences, and the interaction between light and matter at the picometer scale.

Description

technical field [0001] The present invention relates to a kind of special grating, especially a kind of manufacturing device and method of picometer optical comb and picometer optical comb. , picometer microscopic imaging and many other aspects. Background technique [0002] Picometer-scale measurement is at the forefront of current science and technology. Advanced semiconductor lithography technology can already process nodes of several nanometers, which requires higher-precision measurement technology to calibrate it, that is, optical technology of tens or hundreds of picometers is required for measurement. Therefore, the development of advanced The picometer-scale optical measurement technology is the key to solve the picometer measurement today. [0003] As far as we know, because the picometer scale is too small, there is no traceable picometer measurement benchmark with a large moving range. If a laser interferometer is used, because the laser interferometer has inh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G03F7/20
CPCG02B5/1857G03F7/2022G02F1/21G03F7/0005G03F7/2053G03F7/70466G02B5/18
Inventor 周常河
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com