Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An integrated absorbing/scattering metamaterial for stealth

A technology of metamaterials and substrates, applied in antennas, electrical components, etc., can solve the problems of comprehensive control of electromagnetic wave absorption and scattering, and achieve the effects of efficient reduction, wide application space, and low processing costs

Active Publication Date: 2021-03-30
AIR FORCE UNIV PLA
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the above two designs for regulating electromagnetic waves by metamaterials mainly absorb electromagnetic waves unilaterally or control the propagation direction of reflected waves, and do not realize the comprehensive control of electromagnetic wave absorption and scattering.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An integrated absorbing/scattering metamaterial for stealth
  • An integrated absorbing/scattering metamaterial for stealth
  • An integrated absorbing/scattering metamaterial for stealth

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] In order to enable those skilled in the art to better understand that the technical solutions of the present invention can be implemented, the present invention will be further described below in conjunction with specific examples and accompanying drawings, but the given examples are not intended to limit the present invention.

[0029] A absorbing / scattering integrated stealth metamaterial, such as figure 1 and figure 2 As shown in a, it includes a second metamaterial layer 2, a third substrate 3 (a PMI foam substrate with a thickness of 1 to 3 mm, 2 mm here), a first metamaterial layer 1, and a third substrate 3 arranged in sequence along the direction of electromagnetic propagation. The fourth substrate 4 (the PMI foam substrate with a thickness of 1 to 3mm can be used, here is 2mm) and the metal plate bottom layer 5 (a metal plate with a thickness of 0.017mm); the first metamaterial layer 1 includes the first substrate (FR4 substrate with a thickness of 0.1 mm), a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a wave-absorbing / scattering integrated stealth metamaterial, belonging to the technical field of stealth materials, comprising a second metamaterial layer, a third substrate, a first metamaterial layer, a fourth substrate and The bottom layer of the metal plate, the first metamaterial layer includes a first substrate, an artificial microstructure arranged on the first substrate and a first absorbing metamaterial printed on the first substrate; the first metamaterial The second metamaterial layer includes a second substrate and a second absorbing metamaterial printed on the second substrate, and the second artificial microstructure unit corresponds to the position of the first artificial microstructure unit; the present invention achieves The comprehensive control of absorbing and scattering, through optimizing the structural design, effectively combines absorbing metamaterials and metasurfaces, expanding the frequency bands of both; ultra-broadband, high-efficiency reduction, light weight and ultra-thin characteristics make this Inventions have higher value in practical application.

Description

technical field [0001] The invention belongs to the technical field of stealth materials, and in particular relates to a wave-absorbing / scattering integrated stealth metamaterial. Background technique [0002] With the continuous development and application of radar detection technology, electromagnetic stealth technology for radar detection is becoming more and more important. At present, relatively mature radar stealth technologies mainly include appearance stealth and radar absorbing material coating stealth. Shape stealth means deflecting incident radar waves to non-threatening directions through reasonable shape design, but changes in the external shape will affect the aerodynamic performance of the aircraft. The stealth technology based on the coating of radar absorbing materials is to lose the radar waves emitted by the detection radar in the form of heat energy, but this technology requires a high thickness of the material, resulting in a heavy thickness. Therefore...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01Q17/00H01Q15/00
CPCH01Q15/0086H01Q17/007
Inventor 李勇峰屈绍波荆垚朱志标王甲富王军张介秋
Owner AIR FORCE UNIV PLA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com