Efficient crystalline silicon solar cell and preparation method thereof
A technology of solar cells and crystalline silicon, applied in the field of solar cells, can solve the problems that the hydrogen content of solar cells should not be too high, attenuation, etc.
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Embodiment 1
[0031] A preparation method for high-efficiency crystalline silicon solar cells, the preparation method comprising the steps of:
[0032] (1) Pre-treatment of silicon wafers: put the clean silicon wafers in a carbonitriding furnace, and then introduce a mixed gas of methane and ammonia after vacuuming. The temperature is 900°C, the time is 180min, and the flow rate of methane is 0.9m 3 / h, the flow rate of ammonia gas is 0.6m 3 / h, the carbon potential is 1.0%;
[0033] (2) Texturing: After the silicon wafer is cooled, use a texturing liquid to make texturing on the surface of the silicon wafer at 12°C. The texturing liquid includes the following raw materials in weight percentage:
[0034] 3% sodium hydroxide, 0.2% sodium dodecylbenzenesulfonate, 8% isopropanol, and the balance is water;
[0035] (3) Diffusion: Use a diffusion furnace to perform high-temperature phosphorus diffusion on silicon wafers, form a P-N junction on the surface of the silicon wafer, and use phosphor...
Embodiment 2
[0041] A preparation method for high-efficiency crystalline silicon solar cells, the preparation method comprising the steps of:
[0042] (1) Pre-treatment of silicon wafers: put the clean silicon wafers in a carbonitriding furnace, and then inject a mixed gas of methane and ammonia after vacuuming. The temperature is 1100°C, the time is 150min, and the flow rate of methane is 1.0m 3 / h, the flow rate of ammonia gas is 0.75m 3 / h, the carbon potential is 1.2%;
[0043] (2) Texturing: After the silicon wafer is cooled, use a texturing liquid to make texturing on the surface of the silicon wafer at 10°C. The texturing liquid includes the following raw materials in weight percentage:
[0044] 3% sodium hydroxide, 0.2% sodium dodecylbenzenesulfonate, 8% isopropanol, and the balance is water;
[0045] (3) Diffusion: use a diffusion furnace to perform high-temperature phosphorus diffusion on silicon wafers, form a P-N junction on the surface of the silicon wafer, and use phosphoru...
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