Method to create a free-standing membrane for biological applications
a free-standing membrane and biological technology, applied in the field of free-standing membrane creation for biological applications, can solve the problems of inability to easily and cheaply achieve the size and position control requirements necessary for manufacturing arrays of nanopores, current free-standing membrane fabrication methods are manual, time-consuming and costly,
Active Publication Date: 2020-11-10
APPLIED MATERIALS INC
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Benefits of technology
This approach enables rapid and cost-effective production of well-controlled nanopores and membranes, improving signal-to-noise ratios and enabling efficient DNA sequencing by allowing samples to pass freely through the nanopores, while the thin membranes provide high selectivity and resistance to saline solutions.
Problems solved by technology
Current solid-state nanopore fabrication methods, such as using a tunneling electron microscope, focused ion beam, or electron beam, however, cannot easily and cheaply achieve the size and position control requirements necessary for manufacturing arrays of nanopores.
Additionally, current nanopore fabrication methods are time consuming.
Moreover, current free-standing membrane fabrication methods are manual, time consuming and costly, and cannot be efficiently used to repetitively form a free-standing membrane with the optimum thinness for DNA or RNA sequencing.
Method used
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[0015]Methods of manufacturing well-controlled nanopores using directed self-assembly and methods of manufacturing free-standing membranes using selective etching are disclosed. In one aspect, one or more nanopores are formed by directed self-assembly with block co-polymers to shrink the critical dimension of a feature which is then transferred to a thin film. In another aspect, a method includes providing a substrate having a thin film over a highly etchable layer thereof, forming one or more nanopores through the thin film over the highly etchable layer, for example, by a pore diameter reduction process, and then selectively removing a portion of the highly etchable layer under the one or more nanopores to form a thin, free-standing membrane.
[0016]Methods described herein refer to formation of nanopores on a semiconductor substrate as an example. It is also contemplated that the described methods are useful to form other pore-like structures on various materials, including solid-s...
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Abstract
Methods of manufacturing well-controlled nanopores using directed self-assembly and methods of manufacturing free-standing membranes using selective etching are disclosed. In one aspect, one or more nanopores are formed by directed self-assembly with block co-polymers to shrink the critical dimension of a feature which is then transferred to a thin film. In another aspect, a method includes providing a substrate having a thin film over a highly etchable layer thereof, forming one or more nanopores through the thin film over the highly etchable layer, for example, by a pore diameter reduction process, and then selectively removing a portion of the highly etchable layer under the one or more nanopores to form a thin, free-standing membrane.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application claims benefit of U.S. Provisional Patent Application Ser. No. 62 / 561,976, filed on Sep. 22, 2017, which is herein incorporated by reference in its entirety.BACKGROUNDField[0002]Aspects disclosed herein relate to methods of manufacturing well-controlled nanopores using directed self assembly and methods of manufacturing free-standing membranes using selective etching.Description of the Related Art[0003]Nanopores are widely used for applications such as deoxyribonucleic acid (DNA) and ribonucleic acid (RNA) sequencing. In one example, nanopore sequencing is performed using an electrical detection method, which generally includes transporting an unknown sample through the nanopore, which is immersed in a conducting fluid, and applying electric potential across the nanopore. Electric current resulting from the conduction of ions through the nanopore is measured. The magnitude of the electric current density across a nanopore...
Claims
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IPC IPC(8): G01N27/447B82B3/00G01N33/487B82B1/00B81C1/00
CPCB81C1/00087B82B1/002G01N33/48721G01N27/44791B82B3/0023B81B2203/0127H01L21/3213B81C1/00158
InventorVORA, ANKITOHNO, KENICHIKRAUS, PHILIP ALLANHESABI, ZOHREHJOHNSON, JOSEPH R.
OwnerAPPLIED MATERIALS INC