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Semiconductor memory device and method of manufacturing the same

a memory device and semiconductor technology, applied in the direction of semiconductor devices, semiconductor/solid-state device details, electrical devices, etc., can solve problems such as substrate warpag

Active Publication Date: 2017-01-26
KIOXIA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In such a three-dimensionally structured semiconductor memory device, there is a problem that as a stacking number increases, warping of a substrate occurs due to stress of stacked films.

Method used

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  • Semiconductor memory device and method of manufacturing the same
  • Semiconductor memory device and method of manufacturing the same
  • Semiconductor memory device and method of manufacturing the same

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Experimental program
Comparison scheme
Effect test

first embodiment

Semiconductor Memory Device

[0022]FIG. 1 is a block diagram of a nonvolatile semiconductor memory device according to a first embodiment. The nonvolatile semiconductor memory device of the first embodiment stores write data inputted from an external host 9, in a certain address in a memory cell array 1. In addition, the nonvolatile semiconductor memory device of the first embodiment reads data from a certain address in the memory cell array 1, and outputs the data to the external host 9.

[0023]That is, as shown in FIG. 1, the nonvolatile semiconductor memory device of the first embodiment comprises the memory cell array 1 that stores data. The memory cell array 1 comprises a plurality of memory blocks MB. As will be described later with reference to FIG. 2, these memory blocks MB each comprise: a plurality of memory cells MC; and a bit line BL and a word line WL connected to these memory cells MC.

[0024]As shown in FIG. 1, the nonvolatile semiconductor memory device of the first embodi...

second embodiment

[0074]Next, a configuration of a nonvolatile semiconductor memory device according to a second embodiment will be described with reference to FIG. 30. FIG. 30 is a plan view showing the configuration of the nonvolatile semiconductor memory device of the second embodiment. An overall configuration of the nonvolatile semiconductor memory device of this second embodiment is identical to that of the first embodiment (FIGS. 1 to 4), hence a duplicated description thereof will be omitted. However, as shown in FIG. 30, in this second embodiment, a shape of a through hole H1′ is different from that in the first embodiment. In FIG. 30, portions similar to those of the first embodiment are assigned with identical reference symbols to those assigned in the first embodiment, and descriptions thereof will be omitted. Note that in FIG. 30, illustration of the bit line BL and the source line SL is omitted.

[0075]As shown in FIG. 30, the nonvolatile semiconductor memory device according to the secon...

third embodiment

[0077]Next, a configuration of a nonvolatile semiconductor memory device according to a third embodiment will be described with reference to FIG. 31. FIG. 31 is a plan view showing the configuration of the nonvolatile semiconductor memory device of the third embodiment. An overall configuration of the nonvolatile semiconductor memory device of this third embodiment is identical to that of the first embodiment (FIGS. 1 to 4), hence a duplicated description thereof will be omitted. However, as shown in FIG. 31, in this third embodiment, a shape of a through hole H1c is different from that in the first embodiment. In FIG. 31, portions similar to those of the first embodiment are assigned with identical reference symbols to those assigned in the first embodiment, and descriptions thereof will be omitted. Note that in FIG. 31, illustration of the bit line BL and the source line SL is omitted.

[0078]As shown in FIG. 31, the nonvolatile semiconductor memory device according to the third emb...

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PUM

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Abstract

A semiconductor memory device according to an embodiment comprises a stacked body, a semiconductor layer, a charge accumulation layer, and a slit portion. The stacked body includes a plurality of control gate electrodes stacked above a substrate. The semiconductor layer has one end thereof connected to the substrate, and faces the plurality of control gate electrodes. The charge accumulation layer is positioned between the control gate electrode and the semiconductor layer. The slit portion extends in a direction of the substrate from a surface of the stacked body, wherein the slit portion has its longitudinal direction in a direction intersecting the first direction.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application is based on and claims the benefit of priority from prior U.S. Provisional Patent Application No. 62 / 196,003, filed on Jul. 23, 2015, the entire contents of which are incorporated herein by reference.FIELD[0002]Embodiments described herein relate to a semiconductor memory device and a method of manufacturing the same.BACKGROUNDDescription of the Related Art[0003]A flash memory that stores data by accumulating a charge in a charge accumulation layer, is known. Such a flash memory is connected by a variety of systems such as NAND type or NOR type, and configures a semiconductor memory device. In recent years, increasing of capacity and raising of integration level of such a nonvolatile semiconductor memory device have been proceeding. Moreover, a semiconductor memory device in which memory cells are disposed three-dimensionally (three-dimensional type semiconductor memory device) has been proposed to raise the integration l...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L27/115H01L21/28H01L21/311H01L29/792H01L29/66
CPCH01L27/11582H01L29/792H01L27/11565H01L21/28282H01L29/66833H01L21/31116H01L27/11568H01L23/528H10B43/10H10B43/27H01L29/40117H10B43/30
Inventor NAKAJIMA, KAZUAKIOMOTO, SEIICHITOYODA, HIROSHI
Owner KIOXIA CORP