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Semiconductor device with high-frequency interconnection

A semiconductor and device technology, applied in the field of semiconductor devices, can solve problems such as changes in the transmission characteristics of high-frequency interconnection 101, and achieve the effect of suppressing eddy currents

Inactive Publication Date: 2008-09-17
RENESAS ELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the circuit constant of the high-frequency interconnection 101 fluctuates, resulting in a change in the transmission characteristics of the high-frequency interconnection 101

Method used

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  • Semiconductor device with high-frequency interconnection
  • Semiconductor device with high-frequency interconnection
  • Semiconductor device with high-frequency interconnection

Examples

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no. 1 example

[0029] figure 1 and 2 Each shows a plan view of a semiconductor device according to a first embodiment of the present invention. The semiconductor device 1 includes a high-frequency interconnection 10 and a dummy conductor pattern 20 (second dummy conductor pattern). For example, a current having a frequency of 5 GHz or higher flows through the high-frequency interconnection 10 . The high-frequency interconnection 10 includes an interconnection formed in the shape of a coil, which functions as an inductor 12 . The high frequency interconnect 10 further includes an extraction interconnect 14 which is connected to the coil-shaped inductor 12 .

[0030] A plurality of dummy conductor patterns 20 are provided near the high frequency interconnection 10 . Note that dummy conductor pattern 20 is provided in a layer different from high-frequency interconnection 10 . figure 1 and 2 A layer (first layer) provided with high-frequency interconnection 10 and a layer (second layer) ...

no. 2 example

[0044] Figure 10 and 11 Each shows a plan view of a semiconductor device according to a second embodiment of the present invention. In this example, Figure 11 The layer shown in (the second layer) is set next to the Figure 10 The layer shown in (the first layer) below. The semiconductor device of the second embodiment includes high-frequency interconnection 10 and dummy conductor pattern 20 (second dummy conductor pattern). For example, a current having a frequency of 5 GHz or higher flows through the high-frequency interconnection 10 . The high-frequency interconnection 10 includes an interconnection that is formed in a coil shape and functions as an inductor 12 . The high frequency interconnect 10 further includes an extraction interconnect 14 . One end of the extraction interconnection 14 is connected to the coil-shaped inductor 12 . The other end of the extraction interconnection 14 is connected to, for example, an electrode pad, or a source / drain region of a tra...

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Abstract

The invention provides a semiconductor component, comprising high-frequency interconnections and a virtual conductor pattern (second virtual conductor pattern). The virtual conductor pattern is disposed in an interconnection layer which is different form an interconnection layer with the high-frequency interconnection. The virtual conductor pattern is configured to keep away from the area overlapping the high-frequency in a plane figure. In the interconnection layer with the high-frequency interconnection, the semiconductor component further includes a virtual conductor pattern (first virtualconductor pattern).

Description

technical field [0001] The present invention relates to semiconductor devices, and more particularly, to semiconductor devices having high-frequency interconnections and dummy conductor patterns. Background technique [0002] Figure 7 and 8 Each shows a plan view of a semiconductor device according to the prior art. In semiconductor device 100 , dummy conductor patterns 102 and 103 are provided near high-frequency interconnection 101 . Figure 7 shows the layers forming the high frequency interconnect 101, and Figure 8 Another layer is shown. exist Figure 8 , the region overlapping with the high-frequency interconnection 101 is indicated by a dotted line in plan view. [0003] The dummy conductor pattern 102 is provided in the same layer as the high-frequency interconnect 101 , and the dummy conductor pattern 103 is provided in a layer different from the layer in which the high-frequency interconnect 101 is provided. The dummy conductor pattern is provided for the pu...

Claims

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Application Information

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IPC IPC(8): H01L23/528
CPCH01L2924/0002H01L23/585H01L23/5227H01L23/535H01L23/66H01L23/522H01L2924/00
Inventor 中柴康隆
Owner RENESAS ELECTRONICS CORP
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