Tabulate plasma generating device

A plasma and generating device technology, applied in the field of plasma, can solve the problems of limited technical application, narrow internal space, and restrictions on the shape and size of processed objects, and achieve a wide range of applications, short processing time, and high safety. Effect

Active Publication Date: 2011-04-27
XI AN JIAOTONG UNIV
View PDF7 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, because of its dielectric barrier discharge structure, there are usually two independent electrodes, and the distance between these two electrodes is relatively close. As a result, its internal space is narrow, which directly limits the shape and size of the object to be processed, making this A technical application is limited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Tabulate plasma generating device
  • Tabulate plasma generating device
  • Tabulate plasma generating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The present invention will be described in more detail below in conjunction with the accompanying drawings.

[0020] Such as figure 1 As shown, the flat-plate plasma generating device includes a discharge vessel 1 with a gas supply port 10 and a gas outlet 11 on the left and right sides respectively, and a treatment object inlet 12 is also provided on the side of the discharge vessel 1. Inside the capacitor 1 are sequentially arranged a vertically movable working platform 2 , a Tesla coil 14 connected to a grounded Tesla power supply 15 , and a plasma discharge plate 16 connected to an AC pulse power supply 3 from bottom to top. The frequency of the AC pulse power supply 3 is 10-100KHz and the voltage amplitude is 150-280V. The top of the plasma discharge plate 16 is a flat glass substrate 4 placed horizontally, and the bottom surface of the flat glass substrate 4 is longitudinally provided with a strip discharge electrode group consisting of more than two strip discha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a tabulate plasma generating device under atmospheric pressure. A closed space is provided through a discharging capacitor, a worktable is used for arranging substances to be processed, an alternating current pulse power supply provides a discharging voltage for a plasma discharging board, a Tesla coil is used for generating auxiliary discharging, a trigger medium blocks discharging, and the plasma discharging board is used for main discharge. When the device discharges, the plasma is generated outside the discharging board so that the device can process objects with more complicated shapes and larger sizes, have wider range of applications without needing high voltage or generating electric arcs and have high safety, great disposable processing area, short processing time and high efficiency.

Description

technical field [0001] The invention relates to the field of plasma technology, in particular to a flat-plate plasma generating device under atmospheric pressure. Background technique [0002] Plasma is widely used in smelting, spraying, welding, etching and other fields because of its excellent characteristics. In recent years, due to its good chemical activity, it has become a research hotspot in the fields of sterilization and food preservation. [0003] Plasma is relatively easy to obtain under low pressure conditions, but low pressure requires a special vacuum device, which requires a large investment and complicated operation. Therefore, people continue to develop devices capable of generating plasma even under atmospheric pressure. Currently, there are several atmospheric pressure plasma generating devices: [0004] The first is the glow discharge plasma generating device, which is to place two parallel electrode plates in a closed container, use electrons to excit...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
Inventor 姜涛王超李兵
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap