Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Artificial nails and method for manufacturing artificial nails

A technology of artificial nails and manufacturing methods, which can be applied to manicure or pedicure tools, flat products, clothing, etc., and can solve the problems that the shape of the cut surface is half-attached to the nail plate 10, and the length cannot satisfy the user, and the length is different.

Active Publication Date: 2016-03-30
天津珍熙美容实业有限公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, there is the following problem in the existing semi-adhesive nail sheet 10: when cutting to the desired length of the user, because there is no device to guide the cutting position, the shape of the cutting surface and the length of the semi-adhered nail sheet 10 cannot meet the requirements. user request
And, there is also the problem that when the half-adhesive sheet 10 is cut, its cut length is different from the length of the half-adhesive sheet 10 pasted on other nails.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Artificial nails and method for manufacturing artificial nails
  • Artificial nails and method for manufacturing artificial nails
  • Artificial nails and method for manufacturing artificial nails

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

[0031] For reference, among the structures of the present invention described below, detailed descriptions of the same structures as those of the prior art will be omitted, and the above-mentioned prior art can be referred to.

[0032] image 3 is a top view of an artificial nail according to a preferred embodiment of the present invention, Figure 4 is cutting image 3 A top view of the artificial nail shown after, Figure 5 is coating Figure 4 A top view of the artificial nail shown after, Figure 6 yes Figure 4 A cross-sectional view of the artificial nail shown in use.

[0033] Such as Figure 3 to Figure 6 As shown, the artificial nail of this embodiment includes a nail body 100 on which a marking portion 110 is formed along the width direction, and the marking portion 110 is formed with a surface roughness different from ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to artificial nails and a manufacturing method thereof, in particular to the artificial nails, which comprise nail main bodies, wherein a marking part is formed on each nail main body along the width direction; and the marking part is formed in surface roughness which is different from that of other parts on each nail main body, so after the artificial nails are adhered to nails by a user, the marking part plays a role of a marked line in the process of cutting the artificial nails according to desirable length; therefore, the user can cut the artificial nails into the nails with desirable shapes easily by comparing with lengths of other nails.

Description

technical field [0001] The present invention relates to an artificial nail and a method for manufacturing the artificial nail, and more particularly to an artificial nail including a nail body on which a marking is formed along a width direction, and the marking is formed with a surface roughness different from that of the nail body. Background technique [0002] Existing half paste nail has the disclosed half paste nail of Korea Authorized Patent No. 452280. [0003] The half-adhesive nail 10 is made of transparent plastic material and includes a half-adhesive nail base 11 . The decorative layer 12 is formed on the upper surface of the semi-adhered nail base 11 by spraying or other methods, and white can be applied on the semi-adhered nail base 11 to obtain the effect of applying French nail polish. [0004] One side front end of the half-adhesive nail 10 is the half-adhesive nail sticking part 13, and its thickness is thinner than the half-adhesive nail matrix 11, and the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A45D31/00B29D7/00
Inventor 张成龙
Owner 天津珍熙美容实业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com