A combined quartz glass heating chamber
A quartz glass and heating cavity technology, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve problems such as difficulties in making square quartz glass tubes, overheating of halogen lamp heating power lamp tubes, and reduced energy utilization of equipment. Achieve the effects of improving energy utilization, reducing lamp power, and reducing circulating cooling power
Inactive Publication Date: 2016-08-24
SUN YAT SEN UNIV
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Problems solved by technology
[0002] At present, during the heat treatment of silicon wafers or the production of granular silicon strips, the commonly used atmosphere protection reaction chamber adopts a square cross-section integral transparent high-purity quartz glass tube with open ends. The square quartz glass tube is difficult to manufacture, high in cost, and expensive.
Due to the large length and small section height of the high-purity quartz glass tube, it is difficult to wipe off the condensed silicon or adhered dust on the inner surface of the square glass tube after the silicon wafer is volatilized by high-temperature heating during use, and a large amount of high-concentration hydrogen fluoride must be used The mixed solution of acid and nitric acid is used for cleaning. The cleaning process requires a large amount of acid and requires a large area, which is easy to cause personal injury to the cleaning personnel.
[0003] Here, during the heating process, the heating light incident on the emitting surface is focused on the surface of the silicon wafer or silicon powder placed in the tube, and reflection and refraction will occur when the light is projected through the upper and lower walls of the cristobalite glass tube, about 20% of the light It cannot be incident on the silicon wafer inside the glass tube, resulting in a decrease in the energy utilization rate of the equipment. In order to compensate for the reflection on the surface of the square glass tube, it is necessary to increase the heating power of the halogen lamp and the cooling power of the equipment, which will inevitably increase the energy consumption of the equipment; in addition, Excessive heating power of halogen lamps will easily lead to overheating of the lamp tube, shortening the life of the lamp, and the refraction of the incident light will change the position of the focal line
[0004] During the heating process, if the focus position of the heating light from the halogen heating lamp is not adjusted properly, it is easy to cause the upper and lower surfaces of the transparent high-purity cristobalite quartz glass tube to melt and damage the concentrated light projection area, causing the entire quartz tube to be scrapped
Method used
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Embodiment 1
[0027] Such as figure 1 , Figure 4 , Figure 5 As shown, a combined quartz glass heating chamber according to the present invention includes a detachable transparent quartz glass chamber 1 for placing granular silicon strips and silicon wafers to be heated, and the transparent quartz glass chamber 1 A cylindrical quartz glass cover 2 with a partially cylindrical inner surface for focusing light is provided on it. The cylindrical quartz glass cover 1 is correspondingly placed in the light focusing area of the focusing heating device.
[0028] Such as figure 2 , image 3 As shown, the transparent quartz glass cavity 1 includes a U-shaped quartz glass base 11 with a U-shaped cross section and a quartz glass cover plate 12 placed at the top opening of the U-shaped quartz glass base 11. The U-shaped quartz glass Two ends of the seat body 11 are provided with openings. The top opening of the U-shaped quartz glass base 11 is provided with an accommodating groove 111 for plac...
Embodiment 2
[0032] In the present invention, as Figure 7 As shown, there are two cylindrical quartz glass covers 2, and the cylindrical quartz glass covers 2 are evenly arranged along the longitudinal direction of the quartz glass cover plate 12, and each cylindrical quartz glass cover 2 is axially along the The lateral arrangement of the quartz glass cover plate 12 .
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The invention belongs to the solar photovoltaic field, relates to an atmosphere protection combined-type quartz glass heating cavity for silicon wafer treatment and particularly discloses a combined-type quartz glass heating cavity which comprises a detachable transparent quartz glass cavity body used for placement of particle silicon strips and silicon wafers. A plurality of cylindrical quartz glass covering members used for focusing light are arranged on the transparent quartz glass cavity body, the inner surfaces of the cylindrical quartz glass covering members are part of the cylindrical surfaces, the cylindrical quartz glass covering members are correspondingly placed at a light focusing area of focusing-type heating equipment, and the central lines of the cylindrical quartz glass covering members are coincident with a light focusing position of the focusing-type heating equipment. The combined-type quartz glass heating cavity is simplified in structure and convenient to manufacture, grind and polish, dust adhered inside the cavity body when the cavity is in use is easy to wipe and clean, and silicon generated on the inner surface of a focusing heating area cavity body in the process of heating caused by evaporation and condensation is convenient to clean, so that safety is improved, convenience in maintenance is realized, and maintenance cost is low; heat utilization efficiency of the combined-type quartz glass heating cavity is greatly improved, energy consumption is small, the service life is greatly prolonged, consumption of expensive high-purity quartz glass is reduced, and using cost is lowered.
Description
technical field [0001] The invention relates to the technical field of solar photovoltaic technology silicon wafer processing, in particular to an atmosphere-protected silicon wafer heat treatment quartz reaction chamber used by a granular silicon belt machine. Background technique [0002] At present, during the heat treatment of silicon wafers or the production of granular silicon ribbons, the commonly used atmosphere protection reaction chamber is a square cross-section integral transparent high-purity quartz glass tube with open ends. The square quartz glass tube is difficult to manufacture, and the cost is high. Due to the large length and small section height of the high-purity quartz glass tube, it is difficult to wipe off the condensed silicon or adhered dust on the inner surface of the square glass tube after the silicon wafer is volatilized by high-temperature heating during use, and a large amount of high-concentration hydrogen fluoride must be used The mixed solu...
Claims
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IPC IPC(8): H01L21/67
Inventor刘庆才沈辉白路
OwnerSUN YAT SEN UNIV