Cleaning fluid absorbing device and developing liquid washing equipment

Abstract

The invention relates to the technical field of display, in particular to a cleaning fluid absorbing device which absorbs cleaning fluid mixed with developing liquid through absorption heads to achieve the uniform developing of a display substrate and developing liquid washing equipment with the cleaning fluid absorbing device. The cleaning fluid absorbing device comprises an absorption head arrangement rack arranged on a display substrate conveying platform and the absorption heads arranged on the absorption head arrangement rack, and the absorption heads are connected with an absorption pump. The design of the absorption heads is adopted, and the cleaning fluid washed by the developing liquid washing equipment can be absorbed timely to solve the problems that developing liquid on the surface of the display substrate is not uniformly washed by existing developing liquid washing equipment without the cleaning fluid absorbing device.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a cleaning solution suction device that absorbs a cleaning solution mixed with a developer through a suction head to achieve uniform development of a display substrate, and a developer flushing device equipped with the cleaning solution suction device. Background technique [0002] Currently, in the manufacturing process of display substrates, there is a problem of uneven rinsing in the developer solution washing equipment, which will lead to the problem that the critical size of the local developed pattern of the display substrate is too large or too small, which does not meet the design requirements. In addition, due to the large flow rate of the rinsing liquid, the rinsing liquid will push the working developer to flow to the edge of the display substrate, which will increase the flow rate of the chemical solution at the edge of the display substrate, thereby enhancing...

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Problems solved by technology

[0002] At present, in the display substrate manufacturing process, there is a problem of uneven rinsing of the developer solution washing equipment, which will lead to the problem that the critical size of the local developed pattern of the display substrate is too large or too small, which does not meet the design requirements

In addition, due to the large flow rate of the rinsing liquid, the rinsing liquid will push the working developer to flow to the edge of the display substrate, which will increase the flow rate of the chemical solution at the edge of the display substrate, thereby enhancing the development effect of the edge, and will also cause the edge The key size of the area development pattern is uneven; this is because: the flushing device of the developer flushing device generally sprays clean water evenly toward the opposite direction of the display substrate to achieve the purpose of diluting and flushing the developer on the display substrate There are drawbacks in the above design, namely: in the actual factory production process, due to the existence of some unforeseen factors, the cleaning water sprayed by the flushing device will cause local uneven phenomena on the display substrate due to its sprayed speed and distance limitations , which will lead to changes in the critical dimensions of the developed graphics due to partial unwashed display substrates; in addition, during the development process of the display substrate, due to the spraying of cleaning water, the developer will be driven to the edge of the display substrate and flow out Display substrate, which causes the total flow rate of the developer at the edge of the display substrate to be larger than that at the middle during the flushing process, resulting in an enhanced developing effect at the edge of the display substrate, resulting in uneven development of the display substrate as a whole

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