Skin repair mask composition used before and after make-up and preparation method thereof

A skin repairing and composition technology, which is applied in the field of skin repairing mask composition before and after makeup and its preparation field, can solve the problems of poor nursing effect, poor targeting of the mask, etc., achieves better effect, excellent natural absorption, strong effect

Inactive Publication Date: 2014-08-20
GUANGZHOU JIEBAO COMMODITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing facial masks are not highly targeted and have poor nursing efficacy.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] A skin repair mask composition before and after makeup, which is prepared from the following raw materials calculated in parts by weight,

[0062] Solvent: 30 parts of water;

[0063] Moisturizer: 1 part of butanediol, 1 part of glycerin, 1 part of erythritol, 1 part of trehalose, 1 part of pentylene glycol;

[0064]Emollient: 1 part of algae extract, 0.01 part of sodium hyaluronate, 0.01 part of hydrolyzed collagen, 0.01 part of hydrolyzed silk, 0.5 part of EGF, 0.1 part of white leaf chrysanthemum flower extract, 0.5 part of licorice root extract, 0.1 part of chrysanthemum extract, 1 part of dextran;

[0065] Preservatives: 0.1 part of phenoxyethanol, 0.01 part of methylparaben;

[0066] Neutralizer: 0.05 parts of triethanolamine;

[0067] Solubilizer: 0.01 parts of PE-40 hydrogenated castor oil;

[0068] Thickener: 0.05 parts of carbomer;

[0069] Essence 0.005 part.

Embodiment 2

[0071] A skin repair mask composition before and after makeup, which is prepared from the following raw materials calculated in parts by weight,

[0072] Solvent: 80 parts of water;

[0073] Moisturizer: 10 parts of butanediol, 5 parts of glycerin, 5 parts of erythritol, 3 parts of trehalose, 5 parts of pentylene glycol;

[0074] Emollient: 10 parts of algae extract, 1 part of sodium hyaluronate, 1 part of hydrolyzed collagen, 1 part of hydrolyzed silk, 2 parts of EGF, 0.5 parts of Helichrysum chinensis flower extract, 2 parts of licorice root extract, chamomile flower extract 0.5 parts, 10 parts of dextran;

[0075] Preservatives: 1 part of phenoxyethanol, 1 part of methylparaben;

[0076] Neutralizer: 1 part of triethanolamine;

[0077] Solubilizer: 0.05 parts of PE-40 hydrogenated castor oil;

[0078] Thickener: Carbomer 1 part;

[0079] Essence 0.05 parts.

Embodiment 3

[0081] A skin repair mask composition before and after makeup is prepared from the following raw materials calculated in parts by weight:

[0082] Solvent: 69.15 parts of water;

[0083] Moisturizer: 8.00 parts of butanediol, 3.00 parts of glycerin, 3.00 parts of erythritol, 1.50 parts of trehalose, 1.50 parts of pentylene glycol;

[0084] Emollients: algae extract 5.00 parts, sodium hyaluronate 0.100 parts, hydrolyzed collagen 0.20 parts, hydrolyzed silk 0.20 parts, EGF 1.00 parts, white leaf chrysanthemum flower extract 0.25 parts, licorice root extract 1.00 parts, chamomile flower 0.30 parts of extract, 5.00 parts of dextran;

[0085] Preservatives: 0.10 parts of methylparaben, 0.40 parts of phenoxyethanol;

[0086] Neutralizer: 0.12 parts of triethanolamine,

[0087] Solubilizer: 0.03 parts of PE-40 hydrogenated castor oil;

[0088] Thickener: 0.14 parts of carbomer;

[0089] Essence 0.01 part.

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Abstract

The invention discloses a skin repair mask composition used before and after make-up. The mask composition is prepared from water, butanediol, glycerol, erythritol, mycose, pentanediol, an algae extract, sodium hyaluronate, hydrolyzed collagen, hydrolyzed silk, an EGF (Epidermal Growth Factor), a prostheca helichrysum extract, a liquorice root extract, a chamomilla recutita flower extract, glucan, phenoxyethanol, methylparaben, triethanolamine, PE-40 hydrogenated castor oil, Carbomer and essence. The mask composition is suitable for make-up people, is more convenient to use, and has a better effect. By using the mask composition, caring steps before make-up and after make-up removal are reduced, the absorption efficiency of facial treatment essence is increased, and time needed by the skin caring before make-up and after make-up removal is saved.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to a skin repair mask composition before and after makeup and a preparation method thereof. Background technique [0002] Make-up is a necessary activity in the daily life of most women. In order to show their most beautiful side to outsiders, they usually use a variety of cosmetics. Successful make-up can arouse women's psychological and physical potential vitality, enhance self-confidence, and make women feel better. People are refreshed, and it also helps to eliminate fatigue and delay aging. However, the damage of makeup to the skin cannot be ignored. If it is not properly maintained, it will accelerate the aging of the skin. And before existing make-up, maintenance steps after makeup remover are generally clean skin—spray toner—wipe lotion or face cream—smear barrier cream—makeup—makeup remover—spray toner—wipe lotion or face cream. There are many and complicated maintenance procedur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61K8/73A61K8/65A61Q19/00
Inventor 周金平
Owner GUANGZHOU JIEBAO COMMODITY
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