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A dual-wavelength pulsed laser radiation dose rate effect simulation system

A radiation dose rate, pulsed laser technology, used in radiation measurement, X/γ/cosmic radiation measurement, measurement devices, etc. The effect of flexible and fast research and verification, reducing test costs

Inactive Publication Date: 2018-12-28
INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, most of the existing domestic laser simulation systems are single-event effect laser simulation systems, and most of them are single-wavelength test systems. The cost of wavelength switching is expensive and cannot meet the requirements of radiation dose rate effect laser simulation.

Method used

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  • A dual-wavelength pulsed laser radiation dose rate effect simulation system

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Embodiment Construction

[0022] The examples of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0023] see figure 1 , a dual-wavelength pulsed laser radiation dose rate effect simulation system, including a dual-wavelength pulsed laser generation system I, a pulsed laser energy attenuation and adjustment system II, and a test and control system III.

[0024] The function of dual-wavelength pulsed laser generation system I is to generate dual-wavelength pulsed lasers and separate the two wavelengths of lasers, including pulsed lasers with a wavelength of 1064nm 1, 1 / 2 wavelength plate 1, frequency doubling crystal 3, and anti-reflection mirror 4, reflecting mirror 5.

[0025] Among them, the pulsed laser 1 with a wavelength of 1064nm generates a pulsed laser with a wavelength of 1064nm, which passes through a 1 / 2 wavelength plate-2, a frequency doubling crystal 3, an antireflection mirror 4, and a mirror 5 in sequence in space. The pulse is adj...

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Abstract

The invention discloses a dual-wavelength pulse laser radiation dose rate effect simulation system.The system comprises a dual-wavelength pulse laser generation system, a pulse laser dual-optical-path energy attenuation and adjusting system and a testing and control system.According to the dual-wavelength pulse laser radiation dose rate effect simulation system, pulse laser with the wavelengths being 532 nm and 1064 nm can be generated at the same time and introduced into the dual-optical-path energy attenuation and adjusting system, the laser of the two wavelengths is different in penetration depth in a semiconductor device and is subjected to light spot focusing or beam expanding through an objective lens or a beam expanding lens, the semiconductor device can be flexibly subjected to sensitive layer and sensitive position positioning, the defects of an existing single-wavelength pulse laser radiation dose rate effect simulation system are effectively overcome, the test cost is lowered, the test efficiency is improved, and an effective means is provided for the pointed radiation hardening design.

Description

technical field [0001] The invention belongs to the research field of radiation effects of semiconductor devices, and mainly relates to a dual-wavelength pulse laser radiation dose rate effect simulation system. Background technique [0002] In many application scenarios, there are many radiation factors. When it interacts with semiconductor devices, it will cause physical processes such as ionization effect and displacement effect, which will seriously affect the performance of the device and the entire system, and may even make it permanently invalid. In-depth understanding of the impact of radiation effects and the exploration of corresponding radiation-resistant hardening technologies are the focus of researchers. [0003] In the early stage, people mainly relied on large-scale ground devices such as electron linear accelerators and various radioactive sources to carry out research on radiation effects. However, these large-scale ground radiation simulation devices hav...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01T1/00
CPCG01T1/00
Inventor 孙鹏龙衡陈飞良李倩李沫代刚张健
Owner INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS