Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Small anti-microbial dustproof cleaning-free fashionable mask

A no-cleaning, mask technology, applied in protective clothing, disinfection, clothing, etc., can solve the problems of difficult virus germs, difficult to realize, and accumulation of virus germs, etc. Effect

Inactive Publication Date: 2016-12-07
吴凰
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Wearing a fashionable small mask to walk outdoors, in addition to being fashionable and beautiful and avoiding showing your face, can also resist certain wind, sand, cold and light. However, small masks that are used for a long time or repeatedly are prone to accumulate viruses and bacteria. After a few hours, it should be removed and replaced and cleaned and disinfected in time, which is not only very troublesome, but also difficult to achieve
In addition, when wearing a small fashion mask for activities in an air-polluted environment, since this small mask has only two or three layers, it is difficult to filter viruses and germs in the air to achieve the effect of disease prevention

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Small anti-microbial dustproof cleaning-free fashionable mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] The technical solutions in the embodiments of the present invention will be specifically described below in conjunction with the accompanying drawings.

[0014] Depend on figure 1 As shown, an antibacterial, dustproof, no-clean fashion small mask includes a mask body 5, an outer decoration layer 2 and a lanyard, and the mask body 5 is a three-layer nano-silver non-woven gauze, and its shape fits the face of the human body The left and right sides of the mask body 5 are provided with lanyards for fixing to the ears of the human body. The main features of the present invention are: the outer surface of the mask body 5 is covered with a waterproof, dustproof and breathable membrane 4, and the waterproof, dustproof and breathable membrane The outer surface of 4 is coated with a layer of photocatalyst coating 3.

[0015] The exterior decoration layer 2 has a network structure, and the outer surface of the exterior decoration layer 2 is coated with fluorescent materials 1 of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a small anti-microbial dustproof cleaning-free fashionable mask which comprises a mask body, an outer decorative layer and hanging ropes. The mask body is made of multiple layers of nano-silver non-woven gauze and is in fit with the face of the human body in shape, the left side and the right side of the mask body are provided with the hanging ropes used for being fixed to ears of the human body, the outer surface of the mask body is coated with a layer of waterproof and dustproof breathable film, the outer surface of the waterproof and dustproof breathable film is coated with a layer of photocatalyst coating, the outer decorative layer is of a net structure, and the outer surface of the outer decorative layer is coated with fluorescence or reflective materials with different colors. The mask is fashionable, attractive, capable of avoiding face exposing, anti-microbial, dustproof and meanwhile capable of omitting troublesome of cleaning and disinfection.

Description

technical field [0001] The invention relates to the field of daily fashion products, in particular to an antibacterial, dustproof and no-cleaning fashion small mask. Background technique [0002] A mask is a sanitary product, generally refers to a device worn on the mouth and nose to filter the air entering the mouth and nose, so as to block harmful gases, odors, and droplets from entering and exiting the wearer's mouth and nose. The structure of the mask is divided into two parts , One is the main body of the mask, made of gauze or paper, etc.; the other is the filter material part, including filter cotton for dust prevention and chemical filter boxes for anti-virus. [0003] Along with the development of social economy and the diversification of culture, a kind of fashionable small mask printed with cute cartoon dolls such as Winnie the Pooh and Sugar Rabbit is very popular among students and fashion women, and has become a daily fashion item. Wearing a fashionable small ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A41D13/01A41D13/11A61L9/18A61L9/01A61L101/02
CPCA41D13/01A41D13/1192A41D31/102A41D31/30A61L9/01A61L9/18
Inventor 罗福基
Owner 吴凰
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products