Developer concentration distributing method in image development process

A developing process and developing solution technology, which is applied in various fluid ratio control, photosensitive material processing, etc., and can solve the problem that the graphics CD deviates from the set range value developing solution, etc.

Active Publication Date: 2016-12-07
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the invention is to solve the problem of CO in the air 2 It will dissolve in the developer and cause the developed graphic CD (Crit

Method used

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  • Developer concentration distributing method in image development process
  • Developer concentration distributing method in image development process
  • Developer concentration distributing method in image development process

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0042] Specific embodiment 1: The method for adjusting the concentration of the developer in the image development process of this embodiment is specifically prepared according to the following steps:

[0043] When in the developer When the concentration exceeds the threshold, adjust the developer concentration Y according to the correction relationship;

[0044] The target concentration M of the developer is calculated according to the concentration Y of the developer and the complementary value of the Offset function; the developer concentration meter in the developer control system (DCS) is measuring the developer There is a certain machine error in the concentration. The concentration meter will be calibrated in the early stage of equipment debugging, and the offset function will be compensated. The elimination of the machine error is based on The change of density realizes the compensation value of the Offset function, and the critical dimension CD of the developed pattern me...

Example Embodiment

[0056] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the concentration Y of the developer according to the correction relationship is specifically:

[0057] By measuring the developer concentration and after measuring the developer Concentration, according to the critical dimension CD of the developed pattern can be maintained at the set value to obtain the developer concentration and developer An approximate relationship between concentration is:

[0058] Y=2.38+2×10 -4 X+8×10 -8 X 2

[0059] Among them, Y is the developer concentration wt%, X is the developer Concentration ppm;

[0060] 2.38% developer normally used in the process When the concentration is 1500ppm~2000ppm (that is, 0.15%~0.20%), the critical dimension CD of the pattern after development meets the set range value, so the correction relation is:

[0061] Y=2.38+2×10 -4 (X-2000)+8×10 -8 (X-2000) 2 .

[0062] Other steps and parameters are the same as in the first embodiment.

[0063] At ...

Example Embodiment

[0065] Specific implementation manner 3: This implementation manner is different from specific implementation manners one or two in that: the compensation value of the function is the compensation value K of the Offset function; the calculation method of the compensation value K of the Offset function is:

[0066] M=N+K-(Y-2.38)

[0067] Among them, N is the theoretical developer concentration; M is the target developer concentration; -(Y-2.38) value is Concentration change update; Offset function is the complement calculation function in excel. Other steps and parameters are the same as those in the first or second embodiment.

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Abstract

The invention relates to an Offset function complement method for eliminating the influence of concentration change on development effects, and aims to solve the problem that the CD (critical dimension) of a developed graph deviates from a set range value as CO2 in air is dissolved in a developer. When the concentration of the developer rises before measurement, the concentration of the developer is distributed according to a certain correction relation. A certain chance difference exists when a developer concentration measuring meter in a DCS (developer control system) measures the concentration of the developer, the concentration measuring meter is calibrated at the early stage of equipment commissioning, Offset functions are complemented according to the concentration change of the developer to eliminate the chance difference, and the concentration of the developer is distributed to keep the CD of the developed graph conforms to the set value. The Offset function complement method is applied to the field of Offset function complement.

Description

technical field [0001] The invention relates to a method for adjusting the concentration of a developer, in particular to a method for adjusting the concentration of a developer in an image developing process. Background technique [0002] The developer control system (DCS) has a concentration meter and an ABS meter. The developer concentration meter consists of a conductivity meter, an ultrasonic concentration meter, and a thermometer. The Sampling Pump takes samples from the Developer Tank to the developer concentration meter and ABS. Measuring meter, in which conductivity meter and ultrasonic concentration meter can measure tetramethylammonium hydroxide (TMAH), photoresist PR and The overall concentration, combined with the two, calculates the tetramethylammonium hydroxide TMAH concentration (C 1 ) and photoresist Concentration (C 2 ); the ABS meter can measure the photoresist PR concentration (UV ABS), which can be obtained concentration, the calculation formula i...

Claims

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Application Information

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IPC IPC(8): G03F7/30G05D11/13
CPCG03F7/30G05D11/13
Inventor 卢大闯
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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