A method for adjusting developer concentration during image development

A developing process and developing solution technology, which can be used in various fluid ratio control, photosensitive material processing and other directions, and can solve the problem of graphics CD deviation from the set range value of the developing solution.

Active Publication Date: 2019-11-22
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the invention is to solve the problem of CO in the air 2 It will dissolve in the developer and cause the developed graphic CD (Critical Dimension critical size) to deviate from the set range value and propose a developer concentration adjustment method in the image development process

Method used

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  • A method for adjusting developer concentration during image development
  • A method for adjusting developer concentration during image development

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Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0042] Specific implementation mode 1: A method for adjusting the developer concentration in the image development process of this embodiment is specifically prepared according to the following steps:

[0043] when in the developer When the concentration exceeds the threshold, adjust the concentration Y of the developer according to the correction relationship;

[0044] According to the concentration Y of the developer and the compensation value of the Offset function, the target concentration M of the developer is calculated; the developer concentration meter in the developer control system (DCS) is measuring the developer There is a certain machine error in the concentration, and the concentration measuring meter will be calibrated in the early stage of equipment debugging, and the offset function will be compensated to eliminate the machine error. The change of the concentration realizes the compensation value of the Offset function, and according to the obtained target...

specific Embodiment approach 2

[0056] Specific embodiment 2: The difference between this embodiment and specific embodiment 1 is that the concentration Y of the developer formulated according to the correction relationship is specifically:

[0057] By measuring developer concentration and measuring post-developer Concentration, according to the critical dimension CD of the pattern after development can be maintained at the set value, the concentration of the developer and the concentration of the developer are obtained. Concentration has an approximate relationship as:

[0058] Y=2.38+2×10 -4 X+8×10 -8 x 2

[0059] Among them, Y is the developer solution concentration wt%, X is the developer solution Concentration ppm;

[0060] 2.38% developer normally used in the process When the concentration is 1500ppm ~ 2000ppm (ie 0.15% ~ 0.20%) after development, the critical dimension CD of the graphics meets the set range value, so the corrected relationship is:

[0061] Y=2.38+2×10 -4 (X-2000)+8×10 -8...

specific Embodiment approach 3

[0065] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is that: the complementary value of the function is the complementary value K of the Offset function; the calculation method of the complementary value K of the Offset function is:

[0066] M=N+K-(Y-2.38)

[0067] Among them, N is the theoretical developer concentration; M is the developer target concentration; -(Y-2.38) value is The concentration change is updated; the Offset function is a supplementary operation function in excel. Other steps and parameters are the same as those in Embodiment 1 or Embodiment 2.

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Abstract

The invention relates to an Offset function complement method for eliminating the influence of concentration change on development effects, and aims to solve the problem that the CD (critical dimension) of a developed graph deviates from a set range value as CO2 in air is dissolved in a developer. When the concentration of the developer rises before measurement, the concentration of the developer is distributed according to a certain correction relation. A certain chance difference exists when a developer concentration measuring meter in a DCS (developer control system) measures the concentration of the developer, the concentration measuring meter is calibrated at the early stage of equipment commissioning, Offset functions are complemented according to the concentration change of the developer to eliminate the chance difference, and the concentration of the developer is distributed to keep the CD of the developed graph conforms to the set value. The Offset function complement method is applied to the field of Offset function complement.

Description

technical field [0001] The invention relates to a method for adjusting the concentration of a developer, in particular to a method for adjusting the concentration of a developer in an image developing process. Background technique [0002] The developer control system (DCS) has a concentration meter and an ABS meter. The developer concentration meter consists of a conductivity meter, an ultrasonic concentration meter, and a thermometer. The Sampling Pump takes samples from the Developer Tank to the developer concentration meter and ABS. Measuring meter, in which conductivity meter and ultrasonic concentration meter can measure tetramethylammonium hydroxide (TMAH), photoresist PR and The overall concentration, combined with the two, calculates the tetramethylammonium hydroxide TMAH concentration (C 1 ) and photoresist Concentration (C 2 ); the ABS meter can measure the photoresist PR concentration (UV ABS), which can be obtained concentration, the calculation formula i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/30G05D11/13
CPCG03F7/30G05D11/13
Inventor 卢大闯
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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