Fluid process processing device
A processing device and process technology, which is applied in the field of fluid process processing devices, can solve the problems that the semiconductor chips of the processing device cannot be accurately processed, the recovery rate of the processing liquid of the semiconductor chip is reduced, and the liquid collection ring has not been developed.
Active Publication Date: 2018-02-06
SCIENTECH
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Problems solved by technology
[0003] However, with the rapid development of science and technology, in order to adapt to different processes or packaging applications, the types of semiconductor chips are gradually diversified. However, the processing devices for semiconductor substrates currently used have not been developed to adjust semiconductor processing devices for different types of semiconductor chips. The technology of the height of the inner liquid collection ring only has a fixed lifting height of each collection ring, which causes the processing device to be unable to accurately handle different types of semiconductor chips, which reduces the recovery rate of the processing liquid of the semiconductor chip, so there is a need for improvement
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[0019] In order to enable your review committee members to better understand the technical content of the present invention, the preferred specific embodiments are described as follows. Please refer to the following Figure 1 to Figure 4 Regarding the hardware architecture diagram of the fluid processing device of the present invention, the schematic cross-sectional view of the fluid processing device, and the cross-sectional views of placing different types of substrates in the fluid processing device.
[0020] Such as figure 1 As shown, the fluid process treatment device 1 of the present invention is applied to a treatment process of the substrate 100, wherein the substrate 100 in this embodiment is a semiconductor chip, and the treatment process is to supply the treatment liquid to the surface of the substrate 100 in the fluid process treatment device 1 (such as chemicals or deionized water, etc.) undergo treatment procedures such as etching and cleaning, and use the fluid...
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Provided is a fluid process processing device. The fluid process processing device comprises a device main body, a parameter acquisition module and a height adjusting module. The device main body comprises a substrate supporting unit and a liquid collection unit, the substrate supporting unit is used for supporting a substrate, the liquid collection unit is arranged around the substrate supportingunit, the parameter acquisition module is electrically connected with the device main body and acquires substrate parameters of the substrate, and the height adjusting module is electrically connected with the parameter acquisition module to adjust the height difference between the substrate supporting unit and the liquid collection unit according to the substrate parameters.
Description
technical field [0001] The present invention relates to a fluid process treatment device, and relates to a fluid process treatment device that adjusts the height difference between a substrate carrying unit and a liquid collection unit according to substrate parameters to improve the recovery rate of treatment liquid. Background technique [0002] Most semiconductor substrate processing devices use lifting collection rings to collect the processing liquid of semiconductor chips. The existing technology uses a collection unit including multiple liquid collection rings. The multiple liquid collection rings must be driven by a lifting mechanism to perform relative lifting movements. When different liquids are collected, specific liquid collection rings can be raised and lowered in advance, so that the liquid can be discharged from the drain pipes below the respective liquid collection rings along the guidance of the respective liquid collection rings. [0003] However, with the...
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Login to View More IPC IPC(8): H01L21/67
CPCH01L21/67023
Inventor 冯傳彰刘茂林吴庭宇许峯嘉简育民
Owner SCIENTECH