A state non-volatile photoswitch based on floating gate charging and discharging and a preparation method thereof
An optical switch, non-volatile technology, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., to achieve the effect of increasing the overlapping area, increasing the overlapping, and shortening the length
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[0057] The embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings and Examples. This embodiment is implemented on the premise of the technical solution of the present invention, and detailed implementation methods and operating procedures are provided, but the protection scope of the present invention is not limited to Examples described below.
[0058] see first figure 1 , figure 1 It is a schematic diagram of the first embodiment of the state non-volatile optical switch of the present invention—planar floating gate structure. The cross-sectional structure of the switch waveguide includes: from bottom to top, monocrystalline silicon substrate, silicon dioxide buried layer (lower cladding layer), monocrystalline silicon n-type doped layer, central insulating silicon dioxide layer, silicon dioxide An isolation layer, a single crystal silicon floating gate layer, an oxygen nitrogen oxide (ONO) isolation layer, an up...
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