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Inductive structure

A technology of inductance and line segments, which is applied in the field of semiconductor structures and can solve problems such as reducing the quality factor of inductance

Active Publication Date: 2021-06-11
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the distribution of magnetic force lines is not good, it will reduce the quality factor of the inductor (quality factor)

Method used

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  • Inductive structure
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Embodiment Construction

[0032] In order to make the purpose, features and advantages of the present invention more comprehensible, the following specifically cites the embodiments, together with the accompanying drawings, for a detailed description. The description of the present invention provides different examples to illustrate the technical features of different implementations of the present invention. Wherein, the configuration of each element in the embodiment is for illustration, not for limiting the present invention. In addition, the partial repetition of the symbols in the figures in the embodiments is for the purpose of simplifying the description, and does not imply the correlation between different embodiments.

[0033] figure 1 It is a diagram of the inductor structure of the present invention. The inductor structure 200 is formed on a substrate 110 and extends in regions R1 - R4 . The region R1 is adjacent to the regions R3 and R4, and is located on the left side of the region R4 a...

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Abstract

The invention discloses an inductance structure formed on a substrate and extending in the first to fourth quadrants. The inductor structure includes an input wire, an output wire and a wire. The wires are connected between the input wires and the output wires. The first part of the wire extends from a starting point, passes through the second quadrant, the fourth quadrant, and ends at an ending point. The second portion of the wire extends from the start point, through the third quadrant, through the first quadrant, and ends at the end point.

Description

technical field [0001] The present invention relates to a semiconductor structure, in particular to an inductor structure. Background technique [0002] Inductors are components that can convert electrical energy into magnetic energy and store it. In order to save the volume of electronic devices, most of the inductors are currently manufactured by semiconductor process. However, inductance elements in integrated circuits usually occupy a relatively large area. In order to reduce the area of ​​the inductor element, it is known to change the layout pattern of the inductor element. But the layout pattern of the inductor is related to the distribution of the magnetic field lines. When the distribution of the magnetic force lines is not good, the quality factor of the inductor will be reduced. Contents of the invention [0003] The invention provides an inductor structure formed on a substrate and located in a first region, a second region, a third region and a fourth regi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01F17/00H01F27/28H01F27/30
Inventor 刘家慎
Owner VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION