Check patentability & draft patents in minutes with Patsnap Eureka AI!

Padding device and padding method for fabrics

A fabric and padding technology, which is applied in the processing of textile materials, textiles and papermaking, and the configuration of equipment for processing textile materials, etc. problem, to achieve the effect of flexible drying design, good dipping effect and convenient padding

Active Publication Date: 2019-06-18
NINGBO GRAPHENE INNOVATION CENT CO LTD
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the structure of the padding device is simple, and the process of one dipping and one rolling is generally adopted, and the low liquid-carrying rate of the fabric in the process of production or experiment of this process becomes the biggest problem of poor surface treatment, and the low liquid-carrying rate causes the slurry to be ineffective. Immersed into the interior of the fabric, and the coverage on the surface of the fiber or yarn is insufficient, it is easy to cause poor abrasion resistance, and the functional performance of the treated fabric cannot reach the expected effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Padding device and padding method for fabrics
  • Padding device and padding method for fabrics
  • Padding device and padding method for fabrics

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] figure 1 It is a schematic diagram of the flow structure of the padding device provided in the embodiment of the present application. see figure 1 , in this embodiment, the padding device includes a first pulling device 10 , a first drying device 20 , a dipping device 30 , a second drying device 40 and a second pulling device 50 arranged in sequence. As shown in the figure, the padding device includes a first pulling device 10 , a first drying device 20 , a dipping device 30 , a second drying device 40 and a second pulling device 50 arranged in sequence from left to right.

[0031] The first traction device 10 and the second traction device 50 control the reciprocating movement of the fabric between the first drying device 20, the soaking device 30 and the second drying device 40, thereby preheating, soaking and drying the fabric in one Operation, so that the soaking effect of the fabric is better.

[0032]In this embodiment, the first traction device 10 and the seco...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a padding device and a padding method for fabrics, and belongs to the technical field of fabric padding. The padding device comprises a sizing device, a sizing mechanism, a drafting device and a second drafting device. The sizing device is provided with a cavity for containing size; the sizing mechanism is arranged in the sizing device; the first drafting device and the second drafting device are located on two sides of the sizing device respectively, and are used for drafting the fabrics to reciprocate along the direction from the first drafting device and the second drafting device. The fabrics are pressed into the size by the sizing mechanism during reciprocating. The padding method includes connecting the fabrics to the first drafting device and the second drafting device, and drafting the fabrics by the first drafting device and the second drafting device to repeatedly soak the fabrics in the size in the sizing device. When the fabrics are padded in the padding device by the padding method, the same fabrics can be padded by one padding device for multiple times, and accordingly, the padding effect of the fabrics is good.

Description

technical field [0001] The present application relates to the technical field of fabric padding, in particular to a padding device and a fabric padding method. Background technique [0002] At present, the structure of the padding device is simple, and the process of one dipping and one rolling is generally adopted, and the low liquid-carrying rate of the fabric in the process of production or experiment of this process becomes the biggest problem of poor surface treatment, and the low liquid-carrying rate causes the slurry to be ineffective. Immersed into the interior of the fabric, and the coverage on the surface of the fiber or yarn is insufficient, it is easy to cause poor abrasion resistance, and the functional performance of the treated fabric cannot reach the expected effect. Contents of the invention [0003] The purpose of this application is to provide a padding device and a fabric padding method, and the padding effect of the fabric is good. [0004] In a first...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D06B3/18D06B23/20D06B15/00
Inventor 赵玉芬赖垂林陈云雷刘兆平
Owner NINGBO GRAPHENE INNOVATION CENT CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com