Moisturizing skin care urea system and application thereof

A urea and system technology, applied in skin care preparations, cosmetic preparations, medical preparations containing active ingredients, etc., can solve the problems of unstable urea additives, easy decomposition and release of ammonia gas, etc. Moisture level, reduce sensory damage, avoid the effect of urea decomposition and volatilization into ammonia gas

Pending Publication Date: 2020-02-07
DOCTOR PLANT GUANGDONG BIOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to overcome the defects and deficiencies of urea additives in existing skin care products that are unstable and easy to decompose and release ammonia, and provide a moisturizing skin care urea system

Method used

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  • Moisturizing skin care urea system and application thereof
  • Moisturizing skin care urea system and application thereof
  • Moisturizing skin care urea system and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] A moisturizing skin care urea system, the urea system has a core-shell structure, the core is a urea composition composed of urea, a moisturizer and a pH regulator, the shell is an emulsified body, and the urea composition has the following mass fraction components: glycerin 10 parts, 3 parts of urea, 0.3 part of lactic acid, 0.3 part of potassium lactate, 5 parts of betaine, 0.5 part of sodium citrate, 0.1 part of citric acid, and the pH value of the urea composition is 4.5.

Embodiment 2

[0044] A moisturizing skin care urea system, the urea system has a core-shell structure, the core is a urea composition composed of urea, a moisturizer and a pH regulator, the shell is an emulsified body, and the urea composition has the following mass fraction components: glycerin 10 parts, 2 parts of urea, 0.1 part of lactic acid, 0.04 part of potassium lactate, 2 parts of betaine, 0.2 part of sodium citrate, 0.03 part of citric acid, and the pH value of the urea composition is 5.43.

[0045] A skin care preparation, comprising the following components by mass:

[0046] A component: moisturizing skin care urea system;

[0047] Component B: 66 parts of water, 0.1 part of sodium hyaluronate, 2.5 parts of humectant, 13 parts of emollient, 3.5 parts of emulsifier, 0.03 part of chelating agent, 0.5 part of thickening stabilizer;

[0048] Component C: 0.5 part of preservative.

[0049] The emollient is 6 parts of synthetic squalane, 1 part of polydimethylsiloxane, 1 part of hydr...

Embodiment 3

[0062] A skin care preparation, comprising the following components by mass:

[0063] A component: the moisturizing skin care urea system of embodiment 5;

[0064] Component B: 66.5 parts of water, 0.1 part of sodium hyaluronate, 11.1 parts of emollient, 2.5 parts of humectant, 4.5 parts of emulsifier, 0.03 part of chelating agent, and 0.95 part of thickening and stabilizing agent;

[0065] Component C: 0.5 part of preservative.

[0066] The emollient is 2 parts of synthetic squalane, 1.5 parts of polydimethylsiloxane, 6.5 parts of cyclopentasiloxane, 0.1 part of beeswax, and 3 parts of octylmethicone.

[0067] The humectant is 2.5 parts of pentylene glycol.

[0068] The emulsifier is 1.5 parts of cetyl PEG / PPG-10 / 1 polydimethylsiloxane and 3 parts of lauryl PEG-9 polydimethylsiloxyethyl polydimethylsiloxane.

[0069] The chelating agent is limited to 0.03 part of disodium EDTA.

[0070] The thickening stabilizer is 0.8 parts of sodium chloride and 0.15 parts of distearyl ...

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PUM

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Abstract

The invention discloses a moisturizing skin care urea composition and application thereof. The moisturizing skin care urea composition comprises urea, glycerol, glycine betaine and pH regulating agents, wherein the pH value of the urea composition is 4.0-5.5, and the urea composition is coated in an emulsifying body. The moisturizing skin care urea composition controls the pH value of the urea composition to be 4.5-5.5, a product keeps good stability under conditions of heat resistance (45 DEG C), cold resistance (15 DEG C below zero), illumination and the like, a situation that the urea is decomposed into ammonia gases is extremely avoided, the damage of skin care product sensuality is reduced, and meanwhile, an important moisturizing ingredient, i.e. the urea, is effectively kept. By useof the moisturizing skin care urea composition disclosed by the invention, through the synergy of each ingredient under a specific system pH value condition, a skin water content is improved by 62-63% in two hours, and the skin water content is improved by 64-72% in four hours so as to be more favorable for improving the dry and peeling appearance of the skin and keeping the moisturizing degree of the skin.

Description

technical field [0001] The present invention relates to the technical field of moisturizing and skin care, more specifically, to a moisturizing skin care urea system and its application. Background technique [0002] Urea is a substance also contained in skin sweat, which has the effect of moisturizing and protecting the health of the epidermis. There are not many existing skin care products containing urea. In some existing skin care products with urea added, the content of urea is not high. One important reason is that urea is unstable and easily decomposes to release ammonia gas, which makes Product produces an unpleasant odor. The pH value of many skin care products currently on the market is easily affected by temperature and storage conditions, and is not stable enough, especially products containing urea are more likely to change, resulting in more unstable urea additives in products and releasing ammonia gas , affect the sensory experience of the product and the mo...

Claims

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Application Information

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IPC IPC(8): A61K8/42A61K8/34A61K8/44A61K8/365A61Q19/00
CPCA61K8/42A61K8/345A61K8/44A61K8/365A61Q19/00A61K2800/592
Inventor 林霁郭文姣杨悬贺锐谢勇
Owner DOCTOR PLANT GUANGDONG BIOTECHNOLOGY CO LTD
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