Pressure cavity structure for comprehensive dielectric property measurement under high pressure and measurement method thereof

A technology of dielectric properties and pressure chambers, which is applied to the pressure chamber structure and its measurement field for comprehensive dielectric property measurement under high pressure, can solve inconvenience and other problems, achieve the effects of not being easily damaged, reducing the difficulty of measurement operation, and simple production

Active Publication Date: 2020-06-09
TONGJI UNIV +2
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] And due to the diversity of measurement of the dielectric properties of insulating materials, different sample chambers need to be used for different measurements, resulting in inconvenience

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pressure cavity structure for comprehensive dielectric property measurement under high pressure and measurement method thereof
  • Pressure cavity structure for comprehensive dielectric property measurement under high pressure and measurement method thereof
  • Pressure cavity structure for comprehensive dielectric property measurement under high pressure and measurement method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Such as figure 1 with figure 2 As shown, this embodiment provides a pressure chamber structure and measurement method for measuring the comprehensive dielectric properties of insulating materials under high pressure, and is used for measuring the comprehensive dielectric properties of insulating materials. The comprehensive dielectric property measurement includes but not It is limited to the measurement of parameters such as dielectric constant / dielectric loss / resistivity / breakdown voltage / space charge.

[0039] The structure of the pressure chamber of this embodiment, its assembly method and measurement method will be described in detail below.

[0040] 1. Pressure chamber structure

[0041] The pressure chamber structure includes a ceramic ring 1, a mold steel sleeve 2, a basalt fiber sleeve 3, a protective top cover 4, an anti-expansion protective steel sleeve 5, a low pressure hole 6, a high pressure hole 7 and a protective bottom sleeve 8. The ceramic ring 1 c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a pressure cavity structure for comprehensive dielectric property measurement under high pressure and a measurement method thereof. The pressure cavity structure comprises a ceramic ring, a die steel sleeve, a basalt fiber sleeve and an anti-expansion protection steel sleeve. The anti-expansion protective steel sleeve is arranged on the outer side of the basalt fiber sleeve in a sleeving manner; a through hole is formed in the basalt fiber sleeve; the side wall of the through hole is connected with the ceramic ring and the die steel sleeve, the lower end of the ceramicring is supported by the side wall of the through hole, the upper end of the ceramic ring is connected with the die steel sleeve, the pressure cavity structure is provided with a low-pressure hole and a high-pressure hole, and the low-pressure hole and the high-pressure hole penetrate through the through hole in the basalt fiber sleeve from the outer side of the pressure cavity structure. Compared with the prior art, the pressure cavity structure can bear higher pressure and can be used for measuring various dielectric properties and has the advantages of convenience in measurement, firmness,reliability, low manufacturing cost and the like.

Description

technical field [0001] The invention relates to the field of comprehensive dielectric property measurement of insulating dielectrics, in particular to a pressure chamber structure and a measurement method for comprehensive dielectric property measurement under high pressure. Background technique [0002] HVDC transmission technology has been vigorously developed in the global power system, and the number of DC cable lines in operation at home and abroad is showing a growing trend. At present, HVDC transmission technology is mainly used in long-distance large-capacity overhead transmission, grid interconnection, long-distance submarine cable transmission and other occasions. The submarine cable transmission project is an important part of the cross-sea networking project construction, and plays an important role in the realization of the internationalization of the power grid and the interconnection of regional power grids. Compared with the laying of tunnels and support sup...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01R31/12G01R27/26G01R29/24
CPCG01R27/2694G01R29/24G01R31/1272
Inventor 张冶文徐景贤王暄孙亚博郑飞虎
Owner TONGJI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap