A vacuum nitrogen filling humidity control device and a vacuum nitrogen filling environment humidity adjustment method

A vacuum degree and vacuum technology, which is applied in the field of humidity control devices, can solve the problems of no damage to organic cultural relics, no humidity control, etc., and achieve the effects of insecticidal operation, high-precision adjustment, and adjustment.

Active Publication Date: 2022-05-27
TIANJIN CNRO SCI TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the currently widely used vacuum nitrogen-filled insecticidal devices cannot effectively control the humidity, so that they cannot cause damage to organic cultural relics during the insecticidal process.

Method used

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  • A vacuum nitrogen filling humidity control device and a vacuum nitrogen filling environment humidity adjustment method
  • A vacuum nitrogen filling humidity control device and a vacuum nitrogen filling environment humidity adjustment method
  • A vacuum nitrogen filling humidity control device and a vacuum nitrogen filling environment humidity adjustment method

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Embodiment Construction

[0022] To make the object, technical solution and advantages of embodiments of the present invention more clear, the following will be combined with the accompanying drawings in the embodiments of the present invention, the technical solutions in the embodiments of the present invention are clearly and completely described, obviously, the embodiments described are part of the embodiments of the present invention, not all embodiments. Based on embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative work, are within the scope of protection of the present invention.

[0023] In the following detailed description, reference may be made to the various drawings of the specification used to illustrate a particular embodiment of the present application as part of the present application. In the drawings, similar reference numerals describe substantially similar components in different drawings. Each particular embo...

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Abstract

The invention relates to a vacuum nitrogen filling and humidity control device, comprising: an airtight enclosure, the airtight enclosure has a rigid structure; a vacuum pump, connected to the airtight enclosure, configured to extract the airtight enclosure The gas in the protection; the humidity control device, which is connected between the nitrogen gas source and the airtight enclosure, and is configured to adjust the nitrogen humidity input into the airtight enclosure; the nitrogen gas source, which is connected with the humidity control device connected, configured to provide nitrogen to the airtight enclosure; and a controller configured to control a vacuum pump to draw gas from the airtight enclosure, and to control a nitrogen source to provide nitrogen to the airtight enclosure . The invention also relates to a method for adjusting the humidity of the vacuum nitrogen filling environment.

Description

Technical field [0001] The present invention relates to a humidity control device, particularly to a humidity control device applied to a vacuum nitrogen filling system and a humidity regulation method. Background [0002] China has a long history of 5,000 years and a splendid culture, and a large number of precious cultural relics have been left behind by successive dynasties. However, these precious objects, especially organic matter artifacts, are highly susceptible to corrosion and destruction because their main components (cellulose, hemicellulose, protein, starch and lignin) can be absorbed and metabolized by insects or microorganisms. [0003] Studies have shown that the combined action of various environmental factors such as temperature and humidity, light, air pollutants, PH value, mold and pests will accelerate the aging rate and damage of cultural relics archives. In contrast, the drastic changes in humidity are more serious to the damage to cultural relics and archiv...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B65D81/20B65D81/22B65D81/18B65D85/50
CPCB65D81/2038B65D81/2069B65D81/22B65D81/18B65D85/50
Inventor 不公告发明人
Owner TIANJIN CNRO SCI TECH
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