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Online heater

A heater and intermediate line technology, applied in the field of wafer cleaning equipment, can solve the problems of large heater space, unfavorable continuous online operation of equipment, long heating time, etc., and achieve the effect of smooth fluid, moderate movement, and large chamber.

Pending Publication Date: 2021-04-06
JIANGSU ASIA ELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the prior art, the heater required for wafer cleaning requires a large space and a long heating time, which is not conducive to the continuous operation of the equipment online

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] This embodiment provides an online heater, such as figure 1 shown, including:

[0043] Cylinder 3, the top and bottom of the cylinder 3 have an inlet pipe 31 and an outlet pipe 32 respectively, a partition is arranged inside the cylinder 3 to divide the cylinder 3 into several chambers in the axial direction, and the chamber includes The first chamber 41, the second chamber 42 and the third chamber 43, the bottom of the first chamber 41 has an inlet pipe 31, the top of the first chamber 41 communicates with the second chamber 42, the second chamber 42 The bottom of the third chamber communicates with the third chamber 43 (communicating through the opening on the partition), and the bottom of the third chamber 43 communicates with the outlet pipe 32; the cylindrical body 3 is also provided with an installation chamber corresponding to each chamber 33. The installation chamber 33 has openings at the top and bottom of the cylinder body 3;

[0044] The heater 2 is inserte...

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PUM

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Abstract

The present invention relates to an online heater. A barrel is divided into a plurality of cavities, the cavities are sequentially communicated, fluid needs to sequentially enter the cavities, each cavity can be heated, and the fluid can be heated for a long time in a limited space. The first cavity serves as a main heating cavity, is large and can contain more fluid, and the first cavity is also the cavity where the fluid moves most violently. Meanwhile, the second chamber and the third chamber can slow down the movement of the fluid, so that the flowing-out fluid is gentle.

Description

technical field [0001] The present application belongs to the technical field of wafer cleaning equipment, and in particular relates to an online heater. Background technique [0002] During the wafer cleaning process, various cleaning solutions are used, such as pickling, alkaline cleaning or water cleaning. In order to improve the cleaning effect, the cleaning solution is usually required to reach a certain temperature, such as 50-60°C. Therefore, it is necessary to The cleaning solution is heated. [0003] In the prior art, the heater required for wafer cleaning requires a large space and a long heating time, which is not conducive to the continuous operation of the equipment online. Contents of the invention [0004] The technical problem to be solved by the present invention is to provide an online heater in order to solve the deficiencies in the prior art. [0005] The technical solution adopted by the present invention to solve its technical problems is: [0006]...

Claims

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Application Information

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IPC IPC(8): H05B3/06H01L21/67
CPCH05B3/06H01L21/6704H01L21/67103
Inventor 钱诚周志勇李文亭
Owner JIANGSU ASIA ELECTRONICS TECH CO LTD