A transparent ultra-wideband electromagnetic shielding device
An electromagnetic shielding and ultra-broadband technology, which is applied in the field of transparent ultra-broadband strong electromagnetic shielding devices and its preparation, can solve the problems of insignificant improvement of shielding performance and reduction of light transmittance
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Embodiment 1
[0085] see figure 1 Structure, the electromagnetic shielding device consists of a transparent conductive layer A (3), a transparent medium A (4), a spaced shielding layer (5), a transparent film (6), a transparent medium B (7), a transparent conductive layer arranged in sequence and arranged in parallel B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.2 ohms, and the conductivity is 1.7×10 7 S m -1 ; The transparent conductive layer is an oxide / metal / oxide three-layer structure composed of a metal oxide and an ultra-thin metal layer; the spaced shielding layer is a silver metal grid, the sheet resistance is 2 ohms, and the conductivity is 1.4 ×10 7 S m -1 . The visible light transmittance of the transparent conductive layer is 90.5%, and the visible light transmittance of the spacer shielding layer is 87.4%
[0086] The specific embodiment is as follows: firstly, the selected glass substrate is ultrasonically cleaned in ethanol, ac...
Embodiment 2
[0089] see figure 1 Structure, the electromagnetic shielding device consists of a transparent conductive layer A (3), a transparent medium A (4), a spaced shielding layer (5), a transparent film (6), a transparent medium B (7), a transparent conductive layer arranged in sequence and arranged in parallel B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.4 ohms, and the conductivity is 1.62×10 7 S m -1 ; The transparent conductive layer is an oxide / metal / oxide three-layer structure composed of a metal oxide and an ultra-thin metal layer; the spacer shielding layer is a silver nanowire layer, the sheet resistance is 50 ohms, and the conductivity is 1.0 ×10 6 S m -1 . The visible light transmittance of the transparent conductive layer was 90.6%, and the visible light transmittance of the spacer shielding layer was 88.8%.
[0090] The specific implementation is as follows: on one side of a transparent glass substrate, silver nanowires wi...
Embodiment 3
[0093] see figure 1 Structure, the electromagnetic shielding device consists of a transparent conductive layer A (3), a transparent medium A (4), a spaced shielding layer (5), a transparent film (6), a transparent medium B (7), a transparent conductive layer arranged in sequence and arranged in parallel B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.6 ohms, and the conductivity is 1.55×10 7 S m -1 ; the transparent conductive layer is an oxide / metal / oxide three-layer structure composed of metal oxide and an ultra-thin metal layer; the interval shielding layer is an ITO layer. The visible light transmittance of the transparent conductive layer was 90.2%, and the visible light transmittance of the spacer shielding layer was 82.3%.
[0094] The specific implementation is as follows: ITO film is coated on one side of the transparent glass substrate by magnetron sputtering. ITO is sputtered by DC power supply, the power is 50W, the thic...
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