Transparent ultra-wideband strong electromagnetic shielding device and preparation method thereof
An electromagnetic shielding and ultra-broadband technology, which is applied in the field of transparent ultra-broadband strong electromagnetic shielding devices and its preparation, can solve the problems of insignificant improvement of shielding performance and reduction of light transmittance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0085] see figure 1 structure, the electromagnetic shielding device is composed of transparent conductive layer A (3), transparent medium A (4), spacer shielding layer (5), transparent film (6), transparent medium B (7), transparent conductive layer B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.2 ohms, and the conductivity is 1.7×10 7 S m -1 ; The transparent conductive layer is an oxide / metal / oxide three-layer structure composed of metal oxide and ultra-thin metal layer; the interval shielding layer is a silver metal grid, the square resistance is 2 ohms, and the conductivity is 1.4 ×10 7 S m -1 . The visible light transmittance of the transparent conductive layer is 90.5%, and the visible light transmittance of the spacer shielding layer is 87.4%.
[0086] The specific implementation method is as follows: firstly, the selected glass substrate is ultrasonically cleaned in ethanol, acetone cleaning solution and deionized water f...
Embodiment 2
[0089] see figure 1 structure, the electromagnetic shielding device is composed of transparent conductive layer A (3), transparent medium A (4), spacer shielding layer (5), transparent film (6), transparent medium B (7), transparent conductive layer B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.4 ohms, and the conductivity is 1.62×10 7 S m -1 ; The transparent conductive layer is an oxide / metal / oxide three-layer structure composed of a metal oxide and an ultra-thin metal layer; the interval shielding layer is a silver nanowire layer with a square resistance of 50 ohms and a conductivity of 1.0 ×10 6 S m -1 . The visible light transmittance of the transparent conductive layer is 90.6%, and the visible light transmittance of the interval shielding layer is 88.8%.
[0090] The specific implementation method is: on one side of the transparent glass substrate, the silver nanowire (the average diameter of the silver nanowire used is 3...
Embodiment 3
[0093] see figure 1 structure, the electromagnetic shielding device is composed of transparent conductive layer A (3), transparent medium A (4), spacer shielding layer (5), transparent film (6), transparent medium B (7), transparent conductive layer B(8) is assembled; the sheet resistance of the transparent conductive layers 3 and 8 is 4.6 ohms, and the conductivity is 1.55×10 7 S m -1 ; The transparent conductive layer is an oxide / metal / oxide three-layer structure composed of metal oxide and ultra-thin metal layer; the interval shielding layer is an ITO layer. The visible light transmittance of the transparent conductive layer is 90.2%, and the visible light transmittance of the interval shielding layer is 82.3%.
[0094] The specific implementation method is: the ITO film is plated on one side of the transparent glass substrate by magnetron sputtering. ITO is sputtered by DC power supply, the power is 50W, the thickness of ITO film is 100nm, the square resistance is 40Ω / s...
PUM
| Property | Measurement | Unit |
|---|---|---|
| electrical resistance | aaaaa | aaaaa |
| electrical conductivity | aaaaa | aaaaa |
| electrical conductivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


