Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Structure and composition for a mask and its container

a mask and container technology, applied in the direction of headwear caps, toys, hats, etc., can solve the problems of not very natural effect, deformation of drawing or image reproduced on the mask, and the presence of elastic bands, etc., to achieve the effect of reducing the risk of injury

Inactive Publication Date: 2009-03-05
TELLUS PAPER INNOVATIONS
View PDF7 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

"The present invention provides a mask structure that can adapt to different faces and heads during use. The mask folds into sectors and has cutting / punching lines that create planes that are differentiated in depth. The mask can be worn without an elastic band or other additional means of support. It can be associated with a sheet consisting of a postcard, a card, a book or an album page, etc. The mask structure keeps its features unchanged even after long usage periods."

Problems solved by technology

This development to a basically cylindrical surface may lead to a deformation of the drawing or image reproduced on the mask which has a not very natural effect.
The presence of the elastic band may turn out to be bothersome during use.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Structure and composition for a mask and its container
  • Structure and composition for a mask and its container
  • Structure and composition for a mask and its container

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019]FIG. 1 shows a schematic plane view of a sheet in paperboard 10 with a rectangular shape. A contour 2 defining a mask structure 1 is executed on sheet 10, by punching, by laser cutting or by another suitable process. Some cuts 3 are made on the mask structure 1, also called mask 1 in the rest of the description. In the example of FIG. 1 the cuts 3 are symmetrically disposed with respect to a vertical symmetry axis x-x. In particular, the symmetry axis x-x is vertically disposed when the mask structure 1 is worn like in the configuration shown in FIG. 2. The cuts 3 made on the mask 1 extend with a value which is inferior to the complete vertical development of the mask 1, that is to say the cuts that have been made do not extend to the upper portion 4 and to the lower portion 5 of the mask 1. In this way, the portions 4 and 5 are affected by bend lines 6, which are represented by discontinuous hatching lines and are disposed adjacent to the upward and downward extension of the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A mask structure comprised of a sheet of paper material, wherein the mask structure includes one or more cuts subdividing said sheet into one or more plane portions connected to one another and disposed at different angles during use of the mask structure.

Description

FIELD OF THE INVENTION[0001]The present invention relates to a structure and composition for a mask and its container.[0002]In particular, the structure subject of the present invention is realizable with a sheet in papery material or in similar materials such as cardboard, paperboard, plastified paper or plastic in a thin sheet of this material.BACKGROUND OF THE INVENTION[0003]Well-known masks in chartaceous material have a planar development and, when they are under rest conditions, that is to say when they are not worn, they extend only to two dimensions. Once they are worn, the masks are curved and define an approximately cylindrical surface. This development to a basically cylindrical surface may lead to a deformation of the drawing or image reproduced on the mask which has a not very natural effect.[0004]Moreover, well-known masks are usually provided with an elastic band which is placed around the head to keep the mask in its position. The presence of the elastic band may tur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): A63H33/00A41G7/00
CPCA41G7/02
Inventor GARDI, CHANAN
Owner TELLUS PAPER INNOVATIONS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products