Structure and composition for a mask and its container
a mask and container technology, applied in the direction of headwear caps, toys, hats, etc., can solve the problems of not very natural effect, deformation of drawing or image reproduced on the mask, and the presence of elastic bands, etc., to achieve the effect of reducing the risk of injury
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[0019]FIG. 1 shows a schematic plane view of a sheet in paperboard 10 with a rectangular shape. A contour 2 defining a mask structure 1 is executed on sheet 10, by punching, by laser cutting or by another suitable process. Some cuts 3 are made on the mask structure 1, also called mask 1 in the rest of the description. In the example of FIG. 1 the cuts 3 are symmetrically disposed with respect to a vertical symmetry axis x-x. In particular, the symmetry axis x-x is vertically disposed when the mask structure 1 is worn like in the configuration shown in FIG. 2. The cuts 3 made on the mask 1 extend with a value which is inferior to the complete vertical development of the mask 1, that is to say the cuts that have been made do not extend to the upper portion 4 and to the lower portion 5 of the mask 1. In this way, the portions 4 and 5 are affected by bend lines 6, which are represented by discontinuous hatching lines and are disposed adjacent to the upward and downward extension of the ...
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