The application discloses a planting method for relieving drought of wheat based on combined application of SiQDs seed dressing and halophilic bacillus, and belongs to the technical field of agricultural planting. The application discloses a planting method for relieving drought of wheat based on combined application of SiQDs seed dressing and halophilic bacillus, which comprises the following steps: using
silicon quantum dots (SiQDs) for seed dressing treatment of wheat seeds, then planting the seed-dressed wheat seeds in soil, and applying halophilic bacillus agent during the growth of the wheat. The combined application of SiQDs and halophilic bacillus GS127 can better promote the root development of wheat under
drought stress, increase the content of
proline and soluble
sugar in the wheat, reduce the content of
malondialdehyde, enhance the
drought resistance of the wheat, effectively promote the growth of the wheat, and improve the yield and
water use efficiency, and therefore has excellent application potential in the production in agricultural wheat drought areas.