Inversion type OLED display device and preparation method thereof
A device, electroluminescent device technology, applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve problems such as unsuitable mass production, difficulty in developing and synthesizing new materials, process duplication, and difficulty in control, etc. high efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0037] 1) Device structure: Al / Li3N / Alq3 / NPB / HAT / Ag;
[0038] 2) Preparation of cathode structure:
[0039] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, 200nm Al is prepared by evaporation on the substrate first.
[0040] 3) Preparation of electron injection layer:
[0041] Keeping the pressure of the vacuum chamber constant, lithium nitride was decomposed under the conditions of evaporation rate of 0.05nm / s and evaporation temperature of 420°C to prepare a Li thin film as an electron injection layer material with a film thickness of 0.5nm.
[0042] 4) Preparation of organic light-emitting layer:
[0043] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0044] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron...
Embodiment 2
[0048] 1) Device structure: ITO / Li 3 N / Alq3 / NPB / HAT / Ag
[0049] 2) Preparation of cathode structure;
[0050] Etch ITO into the corresponding pattern, as the cathode.
[0051] 3) Preparation of electron injection layer:
[0052] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, lithium nitride was used to decompose under the conditions of evaporation rate of 0.05nm / s and evaporation temperature of 420°C to prepare a Li thin film as an electron injection layer material with a film thickness of 0.5nm.
[0053] 4) Preparation of organic light-emitting layer:
[0054] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0055] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron transport layer, then vapor-deposit 65nm thic...
Embodiment 3
[0059] 1) Device structure: ITO / Li 3 N / Alq 3 / NPB / CuPc / ITO
[0060] 2) Preparation of cathode structure:
[0061] Etch ITO into the corresponding pattern, as the cathode.
[0062] 3) Preparation of electron injection layer:
[0063] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, lithium nitride was used to decompose under the conditions of evaporation rate of 0.05nm / s and evaporation temperature of 420°C to prepare a Li thin film as an electron injection layer material with a film thickness of 0.5nm.
[0064] 4) Preparation of organic light-emitting layer:
[0065] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0066] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron transport layer, then vapor-deposit 20nm...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com