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Light irradiation device

A light irradiation device and light shielding technology, which are applied in electrical components, parts of gas discharge lamps, semiconductor/solid-state device manufacturing, etc., can solve problems such as difficult light cleaning treatment

Active Publication Date: 2016-01-20
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, in the above-mentioned light irradiation device, it has been found that there is a problem that pollutants such as organic matter adhering to the object to be irradiated and pollutants such as AMC (Airborne Molecular Contaminants) contained in the air introduced into the lamp housing are The ultraviolet rays of the excimer lamp are activated and react, and the reaction products accumulate on the inner wall of the lampshade, then separate from the inner wall of the lampshade and adhere to the object to be irradiated, so it is difficult to reliably complete the required optical cleaning treatment.

Method used

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Examples

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Effect test

Embodiment 1

[0066] according to figure 1 and figure 2 The composition of the lampshade has a width of 160mm, a height of 250mm, a height of 100mm for the excimer lamp, and a total length (depth) of 3000mm; Light irradiation device of excimer lamp with a length of 2200mm. The excimer lamp of this light irradiation device seals xenon gas in the inside of the discharge vessel, and, as a light shielding unit, covers the upper wall of the discharge vessel and the entire inner surface of each of the four side walls and the peripheral portion of the lower wall. The inner surface forms an ultraviolet shielding film. Furthermore, a glass substrate for liquid crystal is used as the object to be irradiated, and the lamp power of the excimer lamp is 1.6kW, and the ultraviolet irradiation on the outer surface of the discharge vessel is 150mW / cm 2 , The distance between the excimer lamp and the object to be irradiated is 4mm, the gas exhaust volume is 3000l / min, and the conveying speed of the glass...

Embodiment 2

[0070] Except that the position where the ultraviolet shielding film is formed is changed to the entire outer surface of the upper wall and four side walls of the discharge vessel and the outer surface of the peripheral portion of the lower wall, a light irradiation system with the same structure as in Example 1 is made. device. In addition, a glass substrate for liquid crystal was used as the object to be irradiated, and the glass substrate was cleaned under the same conditions as in Example 1, and the contact angles of the surface of the glass substrate before and after the cleaning treatment were measured.

[0071] As a result, the contact angle of the surface of the glass substrate was 40° before the cleaning treatment, but was 2° after the cleaning treatment, and it was confirmed that a high cleaning treatment ability was obtained.

[0072] Furthermore, the light irradiation device was operated continuously for 6 months, and the cleaning treatment of the glass substrate w...

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Abstract

PROBLEM TO BE SOLVED: To provide a light irradiation device that can prevent or restrain reaction products between contaminants, such as organic material attached to an irradiated object, and contaminants contained in the atmosphere from attaching to the irradiated object, thus securely achieving required optical cleaning process.SOLUTION: A light irradiation device comprises: an excimer lamp; a lamp house installed surrounding the excimer lamp and having an opening for emitting light from the excimer lamp outward and a gas outlet for exhausting internal gas; and a gas discharge mechanism for introducing the atmosphere into the lamp house through the opening of the lamp house and exhausting the atmosphere through the gas outlet of the lamp house. The excimer lamp is provided with light shielding means for shielding its radiation light so as to prevent the radiation light from irradiating the wall surface forming a gas passage in the lamp house.

Description

technical field [0001] The present invention relates to a light irradiation device suitable for optically cleaning the surface of substrates such as wafers and glass substrates in the manufacturing process of semiconductor elements and flat panel displays. Background technique [0002] In the manufacturing process of semiconductor elements, flat panel displays such as liquid crystal display devices, solar cells, etc., in order to form a thin film with high adhesion to substrates such as silicon wafers and glass substrates, the surface of the substrate is generally cleaned. The treatment is performed to remove pollutants such as organic substances present on the surface of the substrate. As a method of cleaning the surface of the substrate, a dry cleaning method that does not use water, organic solvents, etc. is widely used. As this dry cleaning method, it is known to irradiate the surface of the object to be processed with excimer light from an excimer lamp, and to clean the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67B08B7/00H01J61/35
CPCH01L21/02041H01L21/268H01L21/67034
Inventor 远藤真一山森贤治石原肇川口真孝
Owner USHIO DENKI KK
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