Method for improving thermochromatic characteristic of vanadium dioxide film
A vanadium dioxide and thin film technology is applied in the field of preparing vanadium dioxide sculpture thin films on a substrate by using a vacuum oblique deposition technology, which can solve the problems of low visible light transmittance, unsatisfactory thermochromic performance and the like, and achieve improved thermochromic performance. , The effect of visible light transmittance improvement
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[0020] Example 1:
[0021] In the chamber of the electron beam evaporation equipment, adjust the angle between the substrate and the evaporation source to 20 degrees, use vanadium pentoxide particles as the film material, the substrate temperature is room temperature, and the oxygen partial pressure is 2*10 -3 At Pa, a vanadium dioxide film is deposited on a quartz substrate, and the deposited film is heat-treated at 600 degrees for 30 minutes in a hydrogen / argon mixed atmosphere to obtain an oblique columnar vanadium dioxide film.
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[0022] Example 2:
[0023] In the chamber of the laser pulse deposition equipment, adjust the angle between the substrate and the evaporation source to 0 degrees while making the substrate rotation speed 256 revolutions per minute, using vanadium tetroxide particles as the film material, the substrate temperature at room temperature, and the oxygen partial pressure as 2.5*10 -3 At Pa, a vanadium dioxide film is deposited on the borosilicate glass substrate, and the deposited film is heat-treated at 500 degrees for 1 hour in an argon atmosphere to obtain a spiral vanadium dioxide film.
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[0024] Example 3:
[0025] In the chamber of the electron beam evaporation equipment, adjust the angle between the substrate and the evaporation source to 80 degrees while making the substrate rotation speed 64 revolutions per minute, using vanadium trioxide particles as the film material, the substrate temperature at room temperature, and the oxygen partial pressure as 3*10 -3 At Pa, a vanadium dioxide film is deposited on the FTO conductive glass substrate, and the deposited film is heat treated at 400 degrees for 10 hours in a mixed atmosphere of air / nitrogen to obtain a C-type vanadium dioxide film.
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