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Preparation method of large-angle multi-band infrared high-reflection film system

A high-reflection film and multi-band technology, applied in the direction of sputtering plating, ion implantation plating, coating, etc., can solve the problems of not wide range, relatively few layers, not too thick film layer, etc., to achieve maximum application The effect of angle range

Inactive Publication Date: 2016-01-13
SOUTH WEST INST OF TECHN PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the scope of the existing high-reflection film is not wide, the number of layers in the design of the film system is relatively small, and the film layer is not too thick (generally <1um)

Method used

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  • Preparation method of large-angle multi-band infrared high-reflection film system
  • Preparation method of large-angle multi-band infrared high-reflection film system
  • Preparation method of large-angle multi-band infrared high-reflection film system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] According to the present invention, the optical film design software (TFCalc) is used to design the optimized film system meeting the technical index requirements of the present invention. The optically processed ZnS or quartz is used as the substrate to coat the surface, and the film system design formula is used:

[0017] G / 1.0M8.6103L11.6067H7.0954L12.203H10.2179L14.5858H7.382L14.4999H6.8875L14.7288H7.0563L14.8196H9.8268L12.606H13.4108L17.5808H12.5002L15.0709H13.5084L15.0556H12.5451L16.2573H15.0726L12 .5404H6.4158L1.0M1.2L(1.3H1L)^ 8 1.0M / A, calculate the optical thickness value of each layer of film and list them in order. In the formula, G represents ZnS or quartz substrate (refractive index N G =2.3 or 1.45), M is the refractive index N M Al = 1.60 2 o 3 Film material, H is the refractive index N H =2.45 ZnSe film material, L is the refractive index N L YbF = 1.45 3 Film material, A is the refractive index N A = 1 air medium, film system reference wavelen...

Embodiment 2

[0038] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 45 layers of film designed in the above-mentioned table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0039] (1) repeat process step (1) in embodiment 1;

[0040] (2) Repeat the process step (2) in Example 1; only the coating substrate is fixed to place the ZnS substrate.

[0041] (3) Repeat the process step (3) in Example 1; only the temperature of the heated and baked substrate is finally fixed and kept for 90 minutes.

[0042] (4) Repeat the process step (4) in Example 1; Before the formal film coating, the ion source parameter is adjusted to the screen electrode voltage and is fixed to 650V, and the speed flow is fixed to 95mA, and the high-purity argon Ar of four 9 of the filling purity is charged. The vacuum control is fixed at 8.5×10 －3 Pa, the generated ion beam bo...

example 3

[0048] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 45 layers of film designed in the above-mentioned table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0049] (1) repeat process step (1) in embodiment 1;

[0050] (2) Repeat the process step (2) in Example 1; just fix the coated substrate as a quartz substrate.

[0051] (3) Repeat the process step (3) in Example 1; only the temperature of the heated and baked substrate is finally fixed and kept for 120 minutes.

[0052] (4) Repeat the process step (4) in Example 1; before the formal film coating in terms of parameters, adjust the ion source parameters to the screen electrode voltage and be fixed at 700V, the speed flow is fixed at 110mA, and the high-purity oxygen O with four 9 of purity is filled 2 , to fix the vacuum control at 9.5×10 －3 Pa, the resulting ion beam bombar...

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Abstract

The invention discloses a wide-angle multiband infrared high-reflective film system and a preparation method thereof, can achieve design and preparation technologies of a film system which can highly reflect incident lights in a wide-angle and in the infrared and far infrared wavebands, improve the fastness property of the film, and prolong the service life of the film under severe wild conditions. The preparation method comprises the following steps: (1) taking ZnS or a quartz glass material as the substrate, calculating the optical thickness of each layer by using the film system design formula; (2) cleaning the electroplated substrate; (3) heating and baking the substrate; (4) bombarding the substrate with an ion source before the electroplating process and during the electroplating process; (5) putting three membrane materials, namely ZnSe, Al2O3, and YbF3, in an evaporation source crucible of a rotation electronic gun, completing an electroplating process by using an optical vacuum electroplating machine according to the formula sequence and thickness value mentioned in the step (1); (6) annealing. The invention solves the technical problems that non-metal and amorphous semiconductor membrane layer cannot be firmly fixed on an infrared material such as ZnS substrate and quartz substrate and cannot obtain a high reflectivity.

Description

technical field [0001] The present invention relates to the method for plating optical film, more specifically, the present invention relates to ZnS or quartz substrate simultaneously to near-infrared (laser wavelength 1.064um) and far-infrared (8~12um) super wide-angle incident (0 ~ 43°) film system design and process preparation plating method of high reflection film. Background technique [0002] As a kind of optical thin film, high reflective film is widely used in various optical and infrared components, solar cells and high-power laser systems. At present, there are many different types of highly reflective coatings that can meet some practical applications in the fields of optics and infrared technology. However, the requirements for the comprehensive performance of high-reflective coatings are constantly increasing in a wider range of practical applications. Currently known highly reflective coatings that are widely used generally use metals (such as gold, silver, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/06C23C14/30C23C14/58C23C14/02G02B1/10
Inventor 王平秋祝冰张玉东代礼密于清杨柳林莉梁志许鸿
Owner SOUTH WEST INST OF TECHN PHYSICS
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