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Method for preparing ultrawide wave band high antireflection film combining three lights

A high anti-reflection coating and wide-band technology, which is applied in the coating field of wide-band high anti-reflection coatings for three-band optical systems, can solve the problems of reduced anti-laser damage ability of the film layer, few types of infrared film materials, and long-term use. , to achieve the effect of good anti-laser damage performance, excellent moisture resistance and protection, hard and firm film layer

Inactive Publication Date: 2010-06-16
SOUTH WEST INST OF TECHN PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, there are few types of infrared film materials that can be used for wide-band high-reflection films involving infrared, and the design and process of film systems are very difficult.
And the current existing optical coating technology can only use hard materials such as quartz, K9 glass, Si and Ge as the coating substrate, so as to ensure the firmness of the film layer
Conventional coatings are used and placed in a humid environment, the surface is in contact with air moisture, the transmittance and water resistance of the anti-reflection coating will gradually decrease, and the anti-laser damage ability of the coating will gradually decrease, so it cannot be used for a long time in harsh outdoor environments

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Firstly, an optimized film system meeting the technical index requirements of the present invention is designed with the advanced optical film design software (TFC) of the United States. Optically processed lithium fluoride (LiF) or barium fluoride (BaF 2 ) The crystal material is the substrate (lens or flat sheet) coated on its surface, and the film system design formula is used:

[0022] G / 4M6H2LM0.6L0.3M / A,

[0023] Calculate the optical thickness value of each film and list them in order. where G is the refractive index N G =1.38 or 1.45, representing lithium fluoride (LiF) or barium fluoride (BaF 2 ) substrate of crystal material, M is the refractive index N M Al = 1.60 2 o 3 Film material, H is the refractive index N H =1.80 SiO film material, L is the refractive index N L = 1.38 MgF 2 Film material, A is the refractive index N A = 1 air medium, film system reference wavelength λ c = 860nm. (The above M, H, L are granular film materials with a purity o...

Embodiment 2

[0045] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 6-layer film calculated and designed in the above table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0046] (1) repeat process step (1) in embodiment 1,

[0047] (2) Repeat the process step (2) in Example 1, except that the substrate to be plated is fixed to place LiF.

[0048] (3) Repeat the process step (3) in Example 1, except that the temperature of the heated and baked substrate is finally fixed and kept for 90 minutes.

[0049] (4) Repeat the process step (4) in Example 1: before the formal film coating in terms of parameters, adjust the ion source parameters to the screen electrode voltage and be fixed at 650V, and the beam current is fixed at 90mA, and the high-purity argon gas Ar with a purity of four 9 is filled, Fix Vacuum Control at 8×10 -3 Pa, the generated i...

Embodiment 3

[0057] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 6-layer film calculated and designed in the above table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0058] (1) Repeat process step (1) in embodiment 1.

[0059] (2) repeat process step (2) in embodiment 1, just be plated substrate be fixed to place BaF 2 .

[0060] (3) Repeat the process step (3) in Example 1, except that the temperature of the heated and baked substrate is finally fixed and kept for 150 minutes.

[0061] (4) Repeat the process step (4) in Example 1: In terms of parameters, before the formal coating, the ion source parameters are adjusted to the screen electrode voltage and fixed to 700V, the beam current is fixed to 100mA, and the high-purity oxygen O with a purity of four 9 is filled. 2 , control the vacuum at a fixed 9×10 -3 Pa, the resulting ion bea...

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PUM

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Abstract

The invention discloses a method for preparing an ultrawide wave band high antireflection film combining three lights. With the method, the design and the plating of a high antireflection plating film with the ultrawide range of multiple optical bands including visible light, near-infrared light and mid-infrared light can be realized. The invention can improve the humidity resistance and the resistance capability of laser induced damage of the film and prolong the service life of the film in a field harsh environment. The invention can be realized by the following technical scheme: (1) using a lithium fluoride or barium fluoride crystal material as a substrate and counting the optical thickness value of each film layer by using a film system design formula of G / 4M6H2LM0.6L0.3M / A; (2) cleaning the plated substrate; (3) mildly baking the substrate; (4) bombarding the substrate by ion sources before film plating and in the process of film plating; (5) placing Al2O3, SiO and MgF2 into a rotating electron gun evaporation source crucible and finishing film plating by using an optical vacuum plating machine according to the formula sequence and the thickness value of the step (1); and (6) carrying out annealing treatment. The invention solves the technical difficulty of insecure film plating on deliquescent soft crystal materials.

Description

technical field [0001] The invention relates to a method for coating an optical film, more specifically, the invention relates to a method for coating a wide-band high anti-reflection film for an optical system with three optical bands (television, laser and infrared). Background technique [0002] As a kind of optical thin film, AR coating is widely used in various optical and infrared components, solar cells and high-power laser systems. At present, there are many different types of anti-reflection coatings that can meet some practical applications in the field of optical and infrared technology. However, the requirements for the comprehensive performance of anti-reflection coatings are constantly increasing in a wider range of practical applications. Currently known high anti-reflection coatings that are widely used can only be coated with an average transmittance of ≥98% to 99% in a relatively narrow range of wavelengths (such as the extended visible light band of 0.7 t...

Claims

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Application Information

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IPC IPC(8): G02B1/11C23C14/24G02B1/115
Inventor 王平秋周九林刘琼薛锦贺祥清于清代礼密安晓强周欢范卫星方黎明张玉东
Owner SOUTH WEST INST OF TECHN PHYSICS
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