Method for preparing ultrawide wave band high antireflection film combining three lights

A high anti-reflection coating and wide-band technology, which is applied in the coating field of wide-band high anti-reflection coatings for three-band optical systems, can solve the problems of reduced anti-laser damage ability of the film layer, few types of infrared film materials, and long-term use. , to achieve the effect of good anti-laser damage performance, excellent moisture resistance and protection, hard and firm film layer

Inactive Publication Date: 2010-06-16
SOUTH WEST INST OF TECHN PHYSICS
View PDF0 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, there are few types of infrared film materials that can be used for wide-band high-reflection films involving infrared, and the design and process of film systems are very difficult.
And the current existing optical coating technology can only use hard materials such as quartz, K9 glass, Si and Ge as the coating substrate, so as to ensure the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0020] Example 1

[0021] First, the American advanced optical thin film design software (TFC) is used to design an optimized film system that meets the technical specifications of the present invention. Use optically processed lithium fluoride (LiF) or barium fluoride (BaF) 2 ) The crystal material is the substrate (lens or flat plate) coated on its surface, using the film system design formula:

[0022] G / 4M6H2LM0.6L0.3M / A,

[0023] Calculate the optical thickness of each film and list it in order. Where G is the refractive index of N G = 1.38 or 1.45, representing lithium fluoride (LiF) or barium fluoride (BaF 2 ) The base of crystalline material, M is the refractive index N M = 1.60 Al 2 O 3 Film material, H is the refractive index N H =1.80 SiO film material, L is the refractive index N L = 1.38 MgF 2 Film material, A is the refractive index N A =1 air medium, film reference wavelength λ c = 860nm. (The above M, H, L are all granular membrane materials with a purity of 99.9%) ...

Example Embodiment

[0044] Example 2

[0045] According to the calculated and designed optical thickness values ​​of each layer of the 6-layer film in Table 1 above, the method of Experimental Example 1 was repeated, using the optimized film formula of the present invention and the optical thickness of each layer in Table 1, in the coating process steps:

[0046] (1) Repeat the process step (1) in Example 1,

[0047] (2) Repeat the process step (2) in Example 1, except that the substrate to be plated is fixed to place LiF.

[0048] (3) Repeat the process step (3) in Example 1, except that the temperature of the heated baking substrate is finally fixed and kept for 90 minutes.

[0049] (4) Repeat the process step (4) in Example 1: In terms of parameters, before the formal coating, adjust the ion source parameters to a fixed screen voltage of 650V, a fixed beam current of 90mA, and a high purity argon gas filled with four 9's. Fix the vacuum control at 8×10 -3 Pa, the generated ion beam bombards the LiF sub...

Example Embodiment

[0056] Example 3

[0057] According to the calculated and designed optical thickness values ​​of each layer of the 6-layer film in Table 1 above, the method of Experimental Example 1 was repeated, using the optimized film formula of the present invention and the optical thickness of each layer in Table 1, in the coating process steps:

[0058] (1) Repeat the process step (1) in Example 1.

[0059] (2) Repeat the process step (2) in Example 1, except that the substrate to be plated is fixed to place BaF 2 .

[0060] (3) Repeat the process step (3) in Example 1, except that the temperature of the heated baking substrate is finally fixed and kept for 150 minutes.

[0061] (4) Repeat the process step (4) in Example 1: In terms of parameters, before the formal coating, adjust the ion source parameters to a fixed screen voltage of 700V, a fixed beam current of 100mA, and a high purity oxygen of four 9's. 2 , Control the vacuum degree to a fixed 9×10 -3 Pa, the generated ion beam bombards BaF ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for preparing an ultrawide wave band high antireflection film combining three lights. With the method, the design and the plating of a high antireflection plating film with the ultrawide range of multiple optical bands including visible light, near-infrared light and mid-infrared light can be realized. The invention can improve the humidity resistance and the resistance capability of laser induced damage of the film and prolong the service life of the film in a field harsh environment. The invention can be realized by the following technical scheme: (1) using a lithium fluoride or barium fluoride crystal material as a substrate and counting the optical thickness value of each film layer by using a film system design formula of G/4M6H2LM0.6L0.3M/A; (2) cleaning the plated substrate; (3) mildly baking the substrate; (4) bombarding the substrate by ion sources before film plating and in the process of film plating; (5) placing Al2O3, SiO and MgF2 into a rotating electron gun evaporation source crucible and finishing film plating by using an optical vacuum plating machine according to the formula sequence and the thickness value of the step (1); and (6) carrying out annealing treatment. The invention solves the technical difficulty of insecure film plating on deliquescent soft crystal materials.

Description

technical field [0001] The invention relates to a method for coating an optical film, more specifically, the invention relates to a method for coating a wide-band high anti-reflection film for an optical system with three optical bands (television, laser and infrared). Background technique [0002] As a kind of optical thin film, AR coating is widely used in various optical and infrared components, solar cells and high-power laser systems. At present, there are many different types of anti-reflection coatings that can meet some practical applications in the field of optical and infrared technology. However, the requirements for the comprehensive performance of anti-reflection coatings are constantly increasing in a wider range of practical applications. Currently known high anti-reflection coatings that are widely used can only be coated with an average transmittance of ≥98% to 99% in a relatively narrow range of wavelengths (such as the extended visible light band of 0.7 t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B1/11C23C14/24G02B1/115
Inventor 王平秋周九林刘琼薛锦贺祥清于清代礼密安晓强周欢范卫星方黎明张玉东
Owner SOUTH WEST INST OF TECHN PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap