Self-cleaning nanometer level glass and its production process
A production process and self-cleaning technology, applied in the field of nano-scale self-cleaning glass and production process, and special performance glass, can solve the problems of difficult cleaning, high price, affecting the decoration and practicability of glass buildings, and achieve a firm film layer Effect
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Embodiment 1
[0016] Add 40ml of ethanol to 10ml of butyl titanate under stirring condition, stir for 1 hour, add 0.8ml of ethyl silicate and 24ml of ethanol, continue stirring for 2 hours, stand for 24 hours before use.
Embodiment 2
[0018] Add 8.5ml of butyl titanate to 40ml of butanol solution, stir for 1 hour, then add 0.9ml of ethyl silicate, continue stirring for 1 hour, add 46ml of butanol, stir for 2 hours, and stand for 24 hours for use .
Embodiment 3
[0020] The glass was scrubbed with foam detergent and cleaned by ultrasonic waves, rinsed with deionized water, air-dried and put into SiO 2 / TiO 2 Immerse in the sol dipping tank for 3 minutes, take it out at a uniform speed, put it into the heat treatment furnace 1 at 100°C and dry it for 10 minutes, then move it into the heat treatment furnace 2 and treat it at 450-500°C for 1 hour, remove it from the furnace, and slowly cool down, the speed It is about 2°C / min, and finally the glass surface forms nano-scale SiO 2 / TiO 2 film.
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