Self-cleaning nanometer level glass and its production process

A production process and self-cleaning technology, applied in the field of nano-scale self-cleaning glass and production process, and special performance glass, can solve the problems of difficult cleaning, high price, affecting the decoration and practicability of glass buildings, and achieve a firm film layer Effect

Inactive Publication Date: 2002-02-20
长春新世纪纳米技术研究所
View PDF0 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The commonly used coated glass has good light transmission, but it is expensive and

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] Add 40ml of ethanol to 10ml of butyl titanate under stirring condition, stir for 1 hour, add 0.8ml of ethyl silicate and 24ml of ethanol, continue stirring for 2 hours, stand for 24 hours before use.

Embodiment 2

[0018] Add 8.5ml of butyl titanate to 40ml of butanol solution, stir for 1 hour, then add 0.9ml of ethyl silicate, continue stirring for 1 hour, add 46ml of butanol, stir for 2 hours, and stand for 24 hours for use .

Embodiment 3

[0020] The glass was scrubbed with foam detergent and cleaned by ultrasonic waves, rinsed with deionized water, air-dried and put into SiO 2 / TiO 2 Immerse in the sol dipping tank for 3 minutes, take it out at a uniform speed, put it into the heat treatment furnace 1 at 100°C and dry it for 10 minutes, then move it into the heat treatment furnace 2 and treat it at 450-500°C for 1 hour, remove it from the furnace, and slowly cool down, the speed It is about 2°C / min, and finally the glass surface forms nano-scale SiO 2 / TiO 2 film.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to nm grade self cleaning glass and its production technique, the glass is cleaned and immersed in SiO2/TiO2 colloidal sol for 2-5 min., lift up with uniform speed, dry, send to heat treatment furnace to sinter into SiO2/TiO2 film layer, edge cut and pack into product. Advantages: firm film layer, acid resisting, no cracking off, possesses super hydrophidle-lyophile performance under the action of UV light, the dirt or oil on glass surface can quickly decompose by the catalytic reaction of film layer etc.

Description

Technical field: [0001] The invention relates to a glass with special performance, specifically discloses a nano-scale self-cleaning glass and its production process, and belongs to the technical field of glass for building materials. Background technique: [0002] At present, with the wide application of glass curtain walls as exterior decoration materials in the construction industry, due to the high buildings and large glass areas, the problem of glass cleaning has become a major problem that plagues people. The commonly used coated glass has good light transmission, but it is expensive and not easy to clean, which affects the decoration and practicality of glass buildings. Invention content: [0003] The invention discloses a nano-scale self-cleaning glass and its production process, the purpose of which is to solve the cleaning problem of the glass, [0004] The technical idea of ​​the present invention is to prepare a layer of nano-scale TiO on the surface of ordina...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C03C17/23
Inventor 周大凡姜华吴洪志宋丕莹张书勤
Owner 长春新世纪纳米技术研究所
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap