Preparation method of antireflection film allowing wide-angle incidence of infrared optical waveband in silicon or germanium base

A technology in infrared optics and substrates, used in sputtering, ion implantation, metal material coating, etc. The problems of reduced capacity, difficult film system design and process, etc., can achieve the effect of high film layer firmness and high density, temperature shock resistance, deliquescence resistance and laser damage resistance, and high density.

Inactive Publication Date: 2015-04-29
SOUTH WEST INST OF TECHN PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, there are few types of infrared film materials that can be used for wide-band high-reflection films involving infrared, and the design and process of film systems are very difficult.
And the existing infrared optical coating technology can only choose such as: ZnS, ZnSe, YbF 3 , ThF 4 , MgF 2 , LiF, CaF 2 , Si, Ge and other materials are used as coating materials to

Method used

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  • Preparation method of antireflection film allowing wide-angle incidence of infrared optical waveband in silicon or germanium base
  • Preparation method of antireflection film allowing wide-angle incidence of infrared optical waveband in silicon or germanium base
  • Preparation method of antireflection film allowing wide-angle incidence of infrared optical waveband in silicon or germanium base

Examples

Experimental program
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Example Embodiment

[0021] Example 1

[0022] According to the present invention, the advanced optical film design software (TFCalc) of the United States is first used to design an optimized film system that meets the technical specifications of the present invention. The optically processed silicon material is used as the substrate to coat the surface, and the film system design formula: G / 0.2L(5H5L)^50.2L / Air is used to optimize the calculation of the optical thickness value of each film and column grids in order. Where G is the base of silicon material and L is the refractive index N L = 1.60 Al 2 O 3 Film material, H is the refractive index N H = 2.20 ZnS film material, Air is the refractive index N A =1 air medium, film reference wavelength λ c = 800nm. The above H and L are granular membrane materials with a purity of 99.9%. The specific steps include:

[0023] (1) Using silicon or germanium material as the base and insulating the surface of the silicon or germanium material from contact with ...

Example Embodiment

[0050] Example 2

[0051] According to the calculated and designed optical thickness values ​​of each layer of the 9-layer film in Table 2 below, the method of Experimental Example 1 was repeated, using the optimized film formula of the present invention and the optical thickness of each layer in Table 2, in the coating process steps:

[0052] (1) Repeat the process step (1) in Example 1;

[0053] (2) Repeat the process step (2) in Example 1;

[0054] (3) Repeat the process step (3) in Example 1;

[0055] (4) Repeat the process step (4) in Example 1;

[0056] (5) Repeat the process step (5) in Example 1;

[0057] The actual optical thickness of each layer recorded after coating is shown in Table 2:

[0058] Table 2 (The optical thickness value table of the 9-layer germanium film actually plated in Example 2)

[0059]

[0060] Note: The value after the decimal point is not taken because the accuracy is sufficient to reach the design scheme.

[0061] (6) Annealing treatment: repeat the process...

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Abstract

The invention discloses a preparation method of an antireflection film allowing the wide-angle incidence of infrared optical wavebands in a silicon or germanium base. Through the utilization of the preparation method disclosed by the invention, the design and the plated preparation of the antireflection film allowing the wide-range high-quality wide-angle range incidence of intermediate infrared optical wavebands of 3 micrometers to 5 micrometers can be realized, so that the firmness capability of a film layer is improved, and the service life of the film layer in the bad wild environment is prolonged. The technical scheme of the preparation method disclosed by the invention is realized by the following steps: (1) using a silicon or germanium material as a base, and calculating the optical thickness value of each film by a film system formula: G/0.2L(5H5L) -50.2L/Air; attacking the base by an ion source before film plating and during film plating; (5) placing ZnS and Al2O3 film materials in a rotary electronic-gun evaporation source crucible, and finishing film plating by an optical vacuum film plating machine according to the thickness value calculated by the film system formula. The preparation method disclosed by the invention solves the difficult technological problem that when nonmetal or non-semiconductor film materials are used on the silicon or germanium base, the plated film is not firm and is difficult to reach high transmittance. The antireflection film prepared by the preparation method disclosed by the invention has the characteristics that the film layer firmness is high, and the transmittance of the wide-angle range incidence can reach 99%.

Description

technical field [0001] The invention relates to a method for coating an optical thin film, more specifically, the invention relates to a method for coating a silicon or germanium substrate with a mid-infrared 3um-5um optical band wide angle range incident anti-reflection coating. Background technique [0002] As a kind of optical film, anti-reflection coating is widely used in various optical and infrared components, solar cells and high-power laser systems. Anti-reflection coating can not only be used in pure optical devices, but also in modern science and technology, especially information The development of optical imaging technology and laser technology can also be widely used in optoelectronic and optical communication devices. At present, there are many different types of anti-reflection coatings that can meet some practical applications in the field of optical and infrared technology. However, the requirements for the comprehensive performance of anti-reflection coat...

Claims

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Application Information

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IPC IPC(8): C23C14/30C23C14/58C23C14/08C23C14/06
CPCC23C14/30C23C14/06C23C14/08C23C14/584
Inventor 王平秋张玉东杨柳于清代礼密林莉吉林陈蔚
Owner SOUTH WEST INST OF TECHN PHYSICS
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