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Preparation method of large-angle multi-band infrared high anti-reflection film system

A high anti-reflection coating, multi-band technology, used in ion implantation plating, coating, instruments, etc., can solve the problems of few infrared coating materials, difficult film system design and process, etc., to improve optical and mechanical properties , Increase adhesion and firmness, improve the effect of density

Active Publication Date: 2017-11-10
SOUTH WEST INST OF TECHN PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, there are very few types of infrared film materials that can be used for wide-band high-reflection coatings involving infrared, and the design and process of the film system are very difficult.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] First, use the advanced optical thin film design software (TFCalc) in the United States to design the optimized film system that meets the technical index requirements of the present invention. Use the optically processed IG5 or IG6 as the substrate to coat the surface, and use the film system design formula:

[0017] G / 0.05M 0.2703L 6.3405H 0.7965L 3.0094H 11.6216L 0.4436H 2.4786L0.05M / A, calculate the optical thickness value of each layer of film and list them in order. In the formula, G represents IG5 or IG6 substrate (refractive index N G =2.6 or 2.7), M is the refractive index N M Al=1.60 2 o 3 Film material, H is the refractive index N H =2.45 ZnSe film material, L is the refractive index N L =1.45YbF 3 Film material, A is the refractive index N A =1 air medium, film system reference wavelength λ c =800nm. (The above M, H, L are granular film materials with a purity of 99.9%)

[0018] List of theoretical average values ​​of the optical thicknesses of the ...

Embodiment 2

[0052] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 9-layer film calculated and designed in the above table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0053] (1) repeat process step (1) in embodiment 1;

[0054] (2) Repeat the process step (2) in Example 1; just fix the coated substrate as the IG5 substrate.

[0055] (3) Repeat the process step (3) in Example 1; only the temperature of the heated and baked substrate is finally fixed and kept for 90 minutes.

[0056] (4) Repeat the process step (4) in Example 1; in terms of parameters, adjust the ion source parameters to the screen electrode voltage and fix it to 650V before the formal coating, and the velocity flow is fixed to 95mA. The vacuum control is fixed at 8.5×10 －3 Pa, the generated ion beam bombarded the IG5 substrate for 30 min.

[0057] (5) Repeat the process...

Embodiment 3

[0064] Repeat the method of Experimental Example 1 by the optical thickness value of each layer of the 9-layer film calculated and designed in the above table 1, adopt the optimal film system formula of the present invention and the optical thickness of each layer of table 1, in the coating process step:

[0065] (1) repeat process step (1) in embodiment 1;

[0066] (2) Repeat the process step (2) in Example 1; just fix the coated substrate as the IG6 substrate.

[0067] (3) Repeat the process step (3) in Example 1; only the temperature of the heated and baked substrate is finally fixed and kept for 120 minutes.

[0068] (4) Repeat the process step (4) in Example 1; in terms of parameters, before the formal coating, adjust the ion source parameters to the screen voltage and fix it to 700V, the speed flow is fixed to 110mA, and the purity is filled with high-purity oxygen O 2 , to fix the vacuum control at 9.5×10 －3 Pa, the generated ion beam bombarded the IG6 substrate for 3...

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Abstract

The invention discloses a preparation method for a large-angle multiband infrared high antireflection film system and aims at providing a preparation method of a large-angle multiband infrared high antireflection film system that has a wide multiband rang, enhanced film layer firmness and long service life in a severe field environment. According to the technical scheme, the method comprises: (1), an optical thickness value of each film layer is calculated by using an IG5 or IG6 material as a substrate based on film system design formulas of G / 0.05M, 0.2703L, 6.3405H, 0.7965L, 3.0094H, 11.6216L,0.4436H, 2.4786L, and 0.05M / A; the plated substrate is cleaned; the substrate is heated and baked; the substrate is bombarded by an ion source before film plating and during film plating; and three kinds of film materials of ZnSe, Al2O3 and YbF3 are placed into a rotating electronic gun evaporator source crucible and film plating is carried out by using an optical vacuum film plating machine by using the thickness values based on the formula sequence. With the method, process problems that the film can not be plated firmly and the high transmittance can not be realized when the non-metal and non-semiconductor film layer materials are used on the infrared material IG5 or IG6 can be solved.

Description

technical field [0001] The present invention relates to a method for coating an optical thin film, more specifically, the present invention relates to an infrared glass (IRG205) IG5 or (IRG206) IG6 substrate that is simultaneously sensitive to near-infrared (laser wavelength 1.064um) and far-infrared (8-12um) Ultra-wideband large-angle incidence (0~50 0 ) film system and preparation process of the high anti-reflection film. Background technique [0002] In optical components, the light energy is lost due to the reflection on the surface of the component. In order to reduce the reflection loss on the surface of the component, a transparent dielectric film is often coated on the surface of the optical component. This film is called an anti-reflection coating. Anti-reflection coating is currently the most widely used type of optical film in the world. With the rapid development of infrared technology, the operating spectrum of the optical system is getting wider and wider. It...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/115C23C14/30C23C14/08C23C14/06C23C14/58
CPCC23C14/0629C23C14/0694C23C14/081C23C14/30C23C14/58G02B1/115
Inventor 王平秋杨柳于清代礼密廖自力薛锦林莉吴杨海吉林祝冰张玉东徐兵何坚张志斌
Owner SOUTH WEST INST OF TECHN PHYSICS
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