Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A mask plate and alignment film rubbing method

A technology of mask plate and orientation film, applied in instruments, nonlinear optics, optics, etc., can solve the problems of friction angle deviation and rubbing cloth orientation damage, and achieve the effect of avoiding friction angle deviation and ensuring display uniformity.

Active Publication Date: 2017-02-08
BOE TECH GRP CO LTD +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the embodiment of the present invention provides a mask plate and an alignment film rubbing method to solve the problem of orientation of the rubbing cloth on the rubbing roller passing through the non-display area in the prior art due to the unevenness of the non-display area. Damage, which in turn causes the problem of friction angle deviation in the friction direction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A mask plate and alignment film rubbing method
  • A mask plate and alignment film rubbing method
  • A mask plate and alignment film rubbing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The specific implementation of the mask plate and alignment film rubbing method provided by the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0035] The shape and size of each film layer in the drawings do not reflect the true proportion of the mask, but are only intended to schematically illustrate the content of the present invention.

[0036] A mask plate provided by an embodiment of the present invention, such as Figure 2a and Figure 2b As shown, the mask plate 01 is used to cover the non-display area of ​​the substrate 02 when rubbing the alignment film on the substrate 02;

[0037] The mask plate 01 includes at least one backing plate 011; wherein,

[0038] One side of the backing plate 011 is a horizontal plane, and the other side has at least a pattern matching the partial pattern of the non-display area at the covering position;

[0039] The thickness of the backing plate 011 at the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a masking plate and an orientation film friction method. The masking plate comprises at least one cushion plate, one side of the cushion plate is a horizontal plate, and the other side of the cushion plate is provided with graphs matched with partial graphs of a non-display area of the coverage position; the thickness of the contact position of the side of the cushion plate with the graphs and a substrate is equal to the distance between the surface of the non-display area and the surface of a display area at the contact position, and the cushion plate is used for covering the non-display area of the substrate when an orientation film on the substrate is subjected to friction, so that the surface of the non-display area at the coverage position is flush with the surface of the display area, orientation damage to friction cloth at the corresponding position caused by unevenness of the surface of the non-display area when the orientation film is subjected to friction is avoided, and thus friction angle error in the friction direction and abnormal orientation of the orientation film are avoided, and display uniformity of display products is guaranteed.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a mask plate and an alignment film rubbing method. Background technique [0002] In recent years, liquid crystal display panels (Liquid Crystal Display, LCD) have gradually spread in people's lives. A liquid crystal display panel is mainly composed of an array substrate, a color filter substrate, and liquid crystal molecules located between the two substrates. The liquid crystal display panel controls the orientation of liquid crystal molecules through an electric field to change the transmittance of the liquid crystal display panel, thereby realizing the display function. In order to arrange the liquid crystal molecules in a certain direction in the initial state, it is necessary to coat a layer of alignment film on the inner surface of the opposite substrate of the liquid crystal display panel and the inner surface of the array substrate, and then use a rubbing ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1337
CPCG02F1/133784
Inventor 胡伟朱亚文楼钰莫再隆朴承翊
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com