Method for acquiring optimal focal plane distance of laser direct imaging equipment

A technology of laser direct imaging and best focal plane, which is applied in the direction of microlithography exposure equipment, optics, photoplate making process of pattern surface, etc. It can solve the problems of inaccuracy, incomplete exposure of dry film, and affecting image quality of graphics, etc. , to achieve the effect of improving detection efficiency and accuracy and reducing the risk of scrapping

Inactive Publication Date: 2016-05-04
HEFEI ADVANTOOLS SEMICON
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Problems solved by technology

Since the laser is focused on the dry film through an optical lens, when the focal plane is just on the surface of the dry film, the intensity of light received by the dry film is the strongest and the image is the clearest, so it is necessary to determine the position of the focal plane before exposure Whether it is on the surface of the dry film, if the focal plane is shifted (that is, commonly known as defocus), it will cause insufficient light intensity received by the exposure pattern on the dry film, and insufficient light intensity will lead to insufficient exposure of the dry film. Completely, after chemical development, it will be dissolved by the

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  • Method for acquiring optimal focal plane distance of laser direct imaging equipment
  • Method for acquiring optimal focal plane distance of laser direct imaging equipment
  • Method for acquiring optimal focal plane distance of laser direct imaging equipment

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Example Embodiment

[0033] Example 1

[0034] The method of obtaining the best focal distance of laser direct imaging equipment is as follows:

[0035] Step 1: The operator inputs a focal plane detection pattern to the laser direct imaging device; the focal plane detection pattern contains 10 exposure patterns;

[0036] Step 2: In a yellow light environment, place a substrate on the exposure workbench of the laser direct imaging equipment. The substrate is a PCB board covered with a photosensitive dry film; the photosensitive dry film is manufactured by Hitachi with the model SL1329 Afterwards, adjust the relative distance between the laser head of the laser direct imaging equipment and the exposure table to 5.00mm;

[0037] Step 3: In the yellow light environment, the laser light generated by the laser head of the laser direct imaging device is directly projected on the substrate according to the shape of the focal plane detection pattern recorded in step 1, which completes the first exposure of the su...

Example Embodiment

[0049] Example 2

[0050] The method of obtaining the best focal distance of laser direct imaging equipment is as follows:

[0051] Step 1: Make a focal plane detection graphic board; the focal plane detection graphic board contains 10 exposure patterns;

[0052] Step 2: In a yellow light environment, place a substrate on the exposure workbench of the laser direct imaging equipment. The substrate is a PCB board covered with a photosensitive dry film; the photosensitive dry film is YQ40PN produced by Asahi Kasei Afterwards, adjust the relative distance between the laser head of the laser direct imaging equipment and the exposure table to 2.00mm;

[0053] Step 3: In the yellow light environment, the laser light generated by the laser head of the laser direct imaging device is directly projected on the substrate according to the shape of the focal plane detection pattern recorded in step 1, which completes the first exposure of the substrate At this time, 10 laser projection areas sim...

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Abstract

In the prior art, the exposure focal plane of laser direct imaging equipment is difficult to rapidly acquire. Based on the difficult problem in the prior art, the present invention provides a method for acquiring the optimal focal plane distance of laser direct imaging equipment. The method comprises: inputting a focal plane detection pattern into laser direct imaging equipment; installing and debugging a substrate; carrying out primary exposure on the substrate; carrying out primary displacement exposure on the substrate; repeatedly performing the displacement exposure on the substrate; developing the substrate; and finding the least shedding pattern on the substrate. According to the present invention, the necessarily-used detection step for measuring the line width by using a microscope in the traditional method is eliminated, the optimal expose focal plane can be quickly, intuitively and accurately found, the detection efficieny and the accuracy of the focal plane are improved, and the PCB reject risk caused by the insufficient exposure is reduced.

Description

technical field [0001] The invention relates to the technical field of printed circuit board pattern transfer, in particular to a method for obtaining the optimal focal plane distance of a laser direct imaging device. Background technique [0002] For the field of printed circuit board processing, especially the manufacture of high-precision HDI boards and packaging substrates, image transfer equipment is undoubtedly the core part. [0003] At present, there are two types of printed circuit board (PCB) image transfer equipment: traditional projection exposure equipment and laser direct imaging equipment (LDI). The graphics of the traditional projection exposure equipment have been printed on the film film, and the film film is irradiated with ultraviolet rays to transfer the figure to the PCB with a photosensitive dry film on the surface. After the dry film is exposed, the unexposed part of the dry film is dissolved by a chemical solution. In the laser direct imaging equipm...

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Application Information

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IPC IPC(8): G03F9/00G03F7/20
Inventor 严孝年吴飞王本祥何少峰方林朱光伟陈和明
Owner HEFEI ADVANTOOLS SEMICON
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