Pockmark removal mask

A facial mask, acne scar technology, applied in the field of beauty and skin care, can solve the problems of acne, not easy to eliminate, hormone level imbalance, etc., to achieve the effect of soft skin

Inactive Publication Date: 2016-06-22
WUHAN HONGXINGJIANG TECH CO LTD
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Today's people, especially adolescent boys and girls, due to the improvement of living standards, eat too much fatty food, and work and study tension, make the hormone level in the body unbalanced, and the sebaceous glands secrete oil vigorously, which makes the facial acne bacilli multiply in large numbers, and then Causes inflammation, often the face is covered with acne, and after the acne disappears, it will leave scars, which are not easy to eliminate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0006] The components of acne scar removal mask are: 30 parts of Angelica dahurica, 50 parts of Bletilla striata, 50 parts of white poria cocos, 50 parts of white pomegranate, 45 parts of white silkworm, 50 parts of Atractylodes macrocephala, 50 parts of white clove, 30 parts of mung bean, 15 parts of chrysanthemum, pearl 20 parts of powder, 50 parts of coix seed. Remove impurities and wash the above components. Dry the above medicinal materials at a temperature not exceeding 70 degrees. Crush and grind the dried medicinal materials, and sieve them through a 120-mesh medicine sieve. Stir the medicinal material powder evenly, put it into bags and pack it separately. Sterilized by cobalt 60 irradiation.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A facial mask for removing acne scars consists of: 20-30 parts of Angelica dahurica, 40-50 parts of Bletilla striata, 40-50 parts of Bai Poria, 40-50 parts of Radix Sinensis, 35-45 parts of white silkworm, 40-50 parts of Atractylodes macrocephala, 40-50 parts of cloves, 20-30 parts of mung beans, 10-15 parts of chrysanthemums, 15-20 parts of pearl powder, 40-50 parts of coix seed. The advantages are: heat-clearing and damp-drying, sterilizing, lightening and whitening, moisturizing and wrinkle-removing, softening the skin, and eliminating the marks left by acne on the face.

Description

technical field [0001] The invention relates to the technical field of beauty and skin care, in particular to a facial mask for removing acne scars. Background technique [0002] Today's people, especially adolescent boys and girls, due to the improvement of living standards, eat too much fatty food, work and study tension, make the hormone level in the body unbalanced, and the sebaceous glands secrete oil vigorously, which makes the facial acne bacilli multiply in large numbers, and then It causes inflammation, and often the face is covered with acne, and after the acne disappears, it will leave scars, which are not easy to eliminate. Contents of the invention [0003] The purpose of the invention is to develop a facial mask for eliminating acne scars on the face with Chinese herbal medicine. [0004] The components of the facial mask for removing acne scars of the present invention are: 20-30 parts of Angelica dahurica, 40-50 parts of Bletilla striata, 40-50 parts of Ba...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61Q19/02A61Q19/00
Inventor 叶波
Owner WUHAN HONGXINGJIANG TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products